Original title:
Screen Printed Diffusion Boron Paste
Translated title:
Difúzní bórové pasty pro sítotisk
Authors:
Jakubka, L. ; Linhart, Jan ; Szendiuch, I. Document type: Papers Conference/Event: EDS '06 - Electronic Devices and Systems IMAPS CS International Conference, Brno (CZ), 2006-09-14 / 2006-09-15
Year:
2006
Language:
eng Abstract:
[eng][cze] This paper shows that Boron pastes can make emitter and back surface field (BSF) formation a simple screen print process. It is possible to achieve high quality p+ emitter on n-type silicon wafers. It is shown that bifacial solar cells can easily be fabricated by using n-type silicon wafers and simultaneous diffusion of Boron paste. Diffusion length in excess of 300um is achievable on commercial wafers for solar cell application using screen-printed Boron pastes. These high quality diffusion pastes can reduce manufacturing cost and make it possible to use less than 150 um thick silicon wafers for bifacial solar cell application. Článek se zabývá použitím bórových past v procesu sítotisku. Lze tak dosáhnout vysoce kvalitní p+ vrstvy na n-typu polovodiče vhodném pro solární články.
Keywords:
Boron pastes; solar cells Project no.: CEZ:AV0Z20650511 (CEP) Host item entry: EDS'06 - Electronic Devices and Systems IMAPS CS International Conference 2006 - Proceedings, ISBN 80-214-3246-2
Institution: Institute of Scientific Instruments AS ČR
(web)
Document availability information: Fulltext is available at the institute of the Academy of Sciences. Original record: http://hdl.handle.net/11104/0141287