Original title:
Modeling of diffusion barrier in nanocrystalline growth
Authors:
Čermák, Jiří ; Rothová, Věra Document type: Papers Conference/Event: International Conference NANO /03./, Brno (CZ), 2003-10-21 / 2003-10-23
Year:
2003
Language:
eng Abstract:
The diffusion of Ge, simulationg the diffusion of Si was studied in eutectic Fe-Nb, in iron and in the Fe2Nb compound, which models the Nb-rich envelope of growing FexSi crystallites in FINEMETs.
Keywords:
FINEMET; Ge diffusion; nanocrystalline growth Project no.: CEZ:AV0Z2041904 (CEP), GA106/01/0384 (CEP), IBS2041105 (CEP), Z20419004-I004 Funding provider: GA ČR, GA AV ČR, GA AV ČR Host item entry: NANO 03, ISBN 80-214-2527-X
Institution: Institute of Physics of Materials AS ČR
(web)
Document availability information: Fulltext is available at the institute of the Academy of Sciences. Original record: http://hdl.handle.net/11104/0075035