Original title: Technologie leptání křemíku
Translated title: The silicon etching technology
Authors: Krátký, Stanislav ; Ježek,, Jan (referee) ; Matějka, Milan (advisor)
Document type: Master’s theses
Year: 2012
Language: cze
Publisher: Vysoké učení technické v Brně. Fakulta elektrotechniky a komunikačních technologií
Abstract: [cze] [eng]

Keywords: BOE; dry plasma etching; monocrystalline silicon (100); plasma CF4; plasma O2; water solution of KOH; wet anisotropic etching.; Leptadlo POL; mokré anizotropní leptání; monokrystalický křemík (100); plazma CF4; plazma O2; suché plazmatické leptání; vodný roztok KOH.

Institution: Brno University of Technology (web)
Document availability information: Fulltext is available in the Brno University of Technology Digital Library.
Original record: http://hdl.handle.net/11012/13482

Permalink: http://www.nusl.cz/ntk/nusl-219382


The record appears in these collections:
Universities and colleges > Public universities > Brno University of Technology
Academic theses (ETDs) > Master’s theses
 Record created 2016-06-03, last modified 2022-09-04


No fulltext
  • Export as DC, NUŠL, RIS
  • Share