Original title: Stabilita optického monitoru při depozici 42-vrstvého interferenčního „bandpass“ filtru 520-590 nm
Translated title: Stability of an optical monitor for deposition of 42-layer interference bandpass filter 520-590 nm
Authors: Žídek, Karel
Document type: Research reports
Year: 2018
Language: cze
Abstract: [cze] [eng]

Keywords: deposition stability; interference filter; thickness monitor; thin layer deposition
Project no.: LO1206 (CEP)
Funding provider: GA MŠk

Institution: Institute of Plasma Physics AS ČR (web)
Document availability information: Fulltext is available at the institute of the Academy of Sciences.
Original record: http://hdl.handle.net/11104/0287992

Permalink: http://www.nusl.cz/ntk/nusl-387521

The record appears in these collections:
Research > Institutes ASCR > Institute of Plasma Physics
Reports > Research reports
 Record created 2018-11-15, last modified 2020-03-27

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