Název:
Proximity effect simulation for variable shape e-beam writer
Autoři:
Kolařík, Vladimír ; Matějka, Milan ; Urbánek, Michal ; Král, Stanislav ; Krátký, Stanislav ; Mikšík, P. ; Vašina, J. Typ dokumentu: Příspěvky z konference Konference/Akce: International Seminar on Recent Trends in Charged Particle Optics and Surface Physics Instrumentation /13./, Skalský dvůr (CZ), 2012-06-25 / 2012-06-29
Rok:
2012
Jazyk:
eng
Abstrakt: Electron Beam Writer (EBW) is a lithographic tool allowing generation of patterns in high resolution. The writing is carried out into a layer of a sensitive material (resist), which is deposited on the substrate surface (e.g. silicon). The resolution of the EBW is limited not only by the beam spot size, but also by the electron scattering effects (forward scattering, backscattering). Thus, even if the beam spot size on the resist surface is very small, due to electron scattering effect in the resist, the exposed area is significantly broader than the original beam spot size [1, 2].
Klíčová slova:
computer simulation; e-beam writer; electron scattering effects Číslo projektu: ED0017/01/01, FR-TI1/576 (CEP) Poskytovatel projektu: GA MŠk, GA MPO Zdrojový dokument: Proceedings of the 13th International Seminar on Recent Trends in Charged Particle Optics and Surface Physics Instrumentation, ISBN 978-80-87441-07-7
Instituce: Ústav přístrojové techniky AV ČR
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Informace o dostupnosti dokumentu:
Dokument je dostupný v příslušném ústavu Akademie věd ČR. Původní záznam: http://hdl.handle.net/11104/0215699