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Development and Application of an UHV Equipment for Deposition of Thin Films (Atomic and Ion Systems)
Mach, Jindřich ; Čech, Vladimír (referee) ; Lencová, Bohumila (referee) ; Šikola, Tomáš (advisor)
In the thesis the development of two equipment for preparation of ultrathin films under ultrahign vacuum conditions (UHV) is discussed. Here, additionally to a brief description of theoretical principles, more details on the design of these units are given. In the first part the design of a thermal source of oxygen or hydrogen atomic beams is discussed. Further, a design and construction of an ion–atomic beam source for ion-beam assisted deposition of thin films is detailed. The source combines the principles of an efusion cell and electron-impact ion beam source generating ions of (30 – 100) eV energy. The source has been successfully applied for the growth of GaN on the Si(111) 7x7 substrate under room temperature.
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Sequential growth of GaN nanocrystals on SiO2 substrate modified by FIB method
Flajšmanová, Jana ; Voborný, Stanislav (referee) ; Mach, Jindřich (advisor)
This bachelor's thesis deals with the selective growth of gallium (Ga) and gallium nitride (GaN). In theoretical part, there is a brief description of growth of ultrathin films with respect to GaN and their manufacturing. Experimental part is aimed to the deposition of Ga and GaN on silicon substrates Si(1 1 1). Substrates with the native silicon dioxide layer (SiO2) were modified by focused ion beam (FIB). GaN was deposited by pulsed deposition followed by postnitridation. Prepared samples were studied by atomic force microscope (AFM), X-ray photoelectron spectroscopy (XPS) and scanning electron microscope (SEM).
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Development and Application of an UHV Equipment for Deposition of Thin Films (Atomic and Ion Systems)
Mach, Jindřich ; Čech, Vladimír (referee) ; Lencová, Bohumila (referee) ; Šikola, Tomáš (advisor)
In the thesis the development of two equipment for preparation of ultrathin films under ultrahign vacuum conditions (UHV) is discussed. Here, additionally to a brief description of theoretical principles, more details on the design of these units are given. In the first part the design of a thermal source of oxygen or hydrogen atomic beams is discussed. Further, a design and construction of an ion–atomic beam source for ion-beam assisted deposition of thin films is detailed. The source combines the principles of an efusion cell and electron-impact ion beam source generating ions of (30 – 100) eV energy. The source has been successfully applied for the growth of GaN on the Si(111) 7x7 substrate under room temperature.
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Sequential growth of GaN nanocrystals on SiO2 substrate modified by FIB method
Flajšmanová, Jana ; Voborný, Stanislav (referee) ; Mach, Jindřich (advisor)
This bachelor's thesis deals with the selective growth of gallium (Ga) and gallium nitride (GaN). In theoretical part, there is a brief description of growth of ultrathin films with respect to GaN and their manufacturing. Experimental part is aimed to the deposition of Ga and GaN on silicon substrates Si(1 1 1). Substrates with the native silicon dioxide layer (SiO2) were modified by focused ion beam (FIB). GaN was deposited by pulsed deposition followed by postnitridation. Prepared samples were studied by atomic force microscope (AFM), X-ray photoelectron spectroscopy (XPS) and scanning electron microscope (SEM).
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