National Repository of Grey Literature 48 records found  1 - 10nextend  jump to record: Search took 0.01 seconds. 
Transparent and semi-transparent thin films for bioelectronics
Jarušek, Jaromír ; Fohlerová, Zdenka (referee) ; Gablech, Imrich (advisor)
This thesis is focused on the development of transparent microelectrode arrays for bioelectronic interfaces with electrogenic cells. The main area of interest is in vitro applications suitable for the observation of living cells using an inverted optical microscope. The theoretical part further discusses different types of transparent and semitransparent electrically conductive materials including gold-based thin films, titanium nitride, carbon-based layers, conductive oxides, and conductive polymers. The experimental part is focused on the process optimization of indium tin oxide (ITO) magnetron sputtering and stressing of TiN-ITO thin films using chemical and electrochemical techniques. The last part is focused on the design, manufacturing, and testing of planar microelectrode arrays made of different electrode materials.
Comparison of properties of thin layers of titanium, nickel and silver used in semiconductor technology
Dorotík, David ; Prášek, Jan (referee) ; Hejátková, Edita (advisor)
Bachelor theses were connected with knowledge of general problems of application of thin films by methods of sputtering and evaporation. Prepare the substrate and clean it before depositing thin layers. The work was focused on the properties of these thin films in semiconductor technology.
Analysis of locally modified surfaces for selective growth of cobalt
Krajňák, Tomáš ; Bábor, Petr (referee) ; Čechal, Jan (advisor)
In this thesis the chemical composition of silicon substrates locally modified by focused gallium ion beam by X-ray photoelectron spectroscopy is determined. In order to determine the influence of focused ion beam, the sample comprising sputtered square areas with nominal depths in range of 1 to 10 nm was prepared. Next, the sample was heated to elevated temperatures (500 - 700 °C) to reveal changes in the sputtered areas induced by annealing. In this work by X-ray photoelectron spectrometer Kratos Supra and electron microscope Tescan LYRA3 with focused ion beam were used. From the measured spectra of the Si 2p and Ga 2p3/2 peaks measured as a function of nominal sputtering depth and annealing temperature the following main observations were obtained. First, there is the additional peak component in the Si 2p peak, which can be assigned to the amorphous silicon. The second important finding is that gallium can be removed from near surface volume by annealing at temperatures beyond 700 °C.
Testing and optimization of an ion source
Glajc, Petr ; Král,, Jaroslav (referee) ; Kolíbal, Miroslav (advisor)
A thorough description of the testing of a saddle-field ion source is presented in the diploma thesis. The most important experimental results, such as Faraday cup measurements of the ion beam current profile and of the ion energy spectra, are included. Based on these results it is shown that the optimized ion source works correctly and according to the expectations. At the end of the thesis, the development of the ion-optical and construction design of the focusing optics is described. The manufactured optics assembly attached to the ion source is also shown.
Evaluation of Different Dielectrics For Mid-Infrared Waveguides
Konečný, Aleš ; Arregi Uribeetxebarria, Jon Ander (referee) ; Detz, Hermann (advisor)
Využití plasmonovo polaritonových vlnovodů se ukázalo vhodné pro senzorové aplikace ve středně infračervené oblasti spektra. Vlnovod je v kontaktu s médiem v plynném či kapalném stavu, který obsahuje měřenou koncentraci hledané látky. Při šíření elektromagnetického vzruchu jsou na něj kladeny podmínky nízkých ztrát a dostatečné interakce s médiem. Tyto podmínky jsou splněny, je-li na kov nanesena tenká dielektrická vrstva. Tato práce je zaměřena na dielektrika na bázi křemíku. Součástí práce byla výroba vícevrstevnatých vlnovodů technikou plazmaticky vylepšené chemické depozice, magnetronového naprašování a metodou fotolitografie. Nanášení vrstev probíhalo na obvykle užívané Si substráty. Hodnocení dielektrických vrstev a výrobních metod probíhá na základě elipsometrických měření indexu lomu a absorbce v infračervené oblasti spektra.
Coating of tools by the PVD HiPIMS technology
Havlíková, Tereza ; Ohnišťová, Petra (referee) ; Píška, Miroslav (advisor)
This bachelor’s thesis is aimed on the study of PVD coatings of tools with a focus on HiPIMS (High Power Impulse Magnetron Sputtering) technology. As part of the research, the PVD coating methods are presented, then the basic physical processes and characteristics of magnetron sputtering are described and finally the HiPIMS technology is analysed. The aim of the experimental part of this study is to evaluate (Al,Ti)N coating deposited by HiPIMS technology on a wire drawing die. For coated and uncoated die, the wear of the die, surface quality and thermal impact on the wire are observed and compared.
Semiconductor devices production on silicon
Ježek, Vladimír ; Mikulík, Petr (referee) ; Špinka, Jiří (advisor)
This work deals with the basic technologies and processes of manufacturing semiconductor devices on a silicon substrate. Deals with the processes from creating a layer of silicon dioxide by oxidation, through the creation of structures using photolithography, the doping of additives into defined areas of diffusion, up to creating contacts and conductive pathways by sputtering. It also deals with the technological production process for silicon devices, description of devices and measurement, calculation layers of silicon dioxide, calculated of diffusion and measured characteristics of components and their evaluation.
Thin film systems
Rada, Vojtěch ; Sedlaříková, Marie (referee) ; Zatloukal, Miroslav (advisor)
This bachelor’s thesis is focused on the problematics of thin-film technology. In the beginning the work deals with a general theory of this problematics, discusses various methods and ways to lay a thin film, where more emphasis is placed on magnetron sputtering, which is used in the practical part of the work, and describes procedures that are performed before and after the application of the thin film. The magnetron sputtering coating machine NP-12 and its control are described in the practical part of the work. Subsequently the selection and adjustment of suitable substrates is made, the thin-film system is deposited using the magnetron sputtering method and the analysis of the properties of deposited thin-film samples is done.
Design of an ion source for sputtering
Glajc, Petr ; Voborný, Stanislav (referee) ; Kolíbal, Miroslav (advisor)
This bachelor's thesis deals with the development of a new type of an ion source. The aim is to design a saddle-field ion source for sputtering. The unique property of the design is that it combines classical cylindrical-symmetry saddle-field ion source with a hot cathode made of tungsten. In the first part of the thesis an overview of the published research in the field of ion sources is presented. The second part deals with an electrostatic-optical design of the source and with simulations of the electrostatic field including trajectories of electrons and ions. Also a crude estimation of the source parameters is made. In the third part the construction design based on previous simulations is described.
Thin-film systems
Kuchařík, Jan ; Máca, Josef (referee) ; Zatloukal, Miroslav (advisor)
This bachelor thesis concerns to create of thin films on various types of substrates. In the theoretical parts is an overview of the formation of thin films using several techniques. The thesis contains an overview of substrate cleaning processes before the deposition of layer plates and tools for evaluating their properties. Finally, the masking method is discussed. In the experimental part, the acquaintance with the NP - 12 sputtering device and the production of samples took place. The adhesion of the produced samples was evaluated. Electrolysis of samples with titanium coated followed. Finally, the silicon substrate was masked.

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