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Application of correlative AFM/SEM microscopy
Hegrová, Veronika ; Fejfar, Antonín (referee) ; Konečný, Martin (advisor)
This thesis is dealing with application of Correlative Probe and Electron Microscopy. All measurements were carried out by atomic force microscope LiteScope which is designed especially to be combined with electron microscopes. Advantages of Correlative AFM/SEM Microscopy are demonstrated on selected samples from field of nanotechnology and material science. Application of the correlative imaging was proposed and then realized particularly in case of low-dimensional structures and thin films. Further, this thesis deals with the possibility of combining Correlative AFM/SEM Microscopy with other integrated techniques of an electron microscope such as Focused Ion Beam and Energy Dispersive X-rays Spectroscopy.
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Application of Graphene Membrane in Nanoelectronic Devices
Kormoš, Lukáš ; Drbohlavová, Jana (referee) ; Bartošík, Miroslav (advisor)
This diploma thesis is focused on the applications and fabrication of graphene membrane from graphene prepared by the chemical vapor deposition. Theoretical part deals with transport properties of the graphene and multiple scattering processes limiting the charge carrier mobility in this material. Included is short review of graphene membrane applications. Experimental part provides fabrication process for achieving suspended graphene device by utilizing electron beam lithography, focused ion beam, chemical etching and patterning of graphene. Graphene membrane is characterized by transport properties measurement and compared to non-suspended graphene.
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Fabrication and characterization of plasmonic nanostructures
Bačo, Ondřej ; Kvapil, Michal (referee) ; Dvořák, Petr (advisor)
This bachelor thesis deals with fabrication and characterization of plasmonic nanostructures. Graphene on a doped silicon substrate with a 285 nm thick layer of silicon dioxide was used for fabrication of these structures. Graphene ribbons with width in the order of hundreds of nanometers were prepared using electron beam lithography (EBL) and reactive ion etching (RIE). Steps in fabrication process were monitored utilizing optical and atomic force microscopy (AFM). Prepared graphene nanostructures were characterized with scanning electron microscope (SEM) and Fourier transform infrared spectrometer (FTIR).
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Industrial applications of optical nanoantennas
Binková, Petra ; Édes, Zoltán (referee) ; Babocký, Jiří (advisor)
This bachelor's thesis deals with fabrication of optical nanoantennas using electron beam lithography and their industrial applications. We have designed optical components that can be used as optical security elements to prevent forgery of plastic bank notes, ID cards, credit cards etc. Designed structures were succesfully fabricated and tested.
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Graphene-on-silicon Schottky junction solar cells
Zahradníček, Radim ; Drbohlavová,, Jana (referee) ; Mach, Jindřich (advisor)
This diploma thesis concerns itself with fabrication and characterization of Schottky solar cell on the graphene/silicon interface. Schottky solar cells were manufactured using a front collector electrode from gold, silver and carbon. On the graphene/silicon interface of the Schottky solar cell an interlayer of Al2O3 or SiO2. For the purpose of IV characterization of the manufactured Schottky solar cell a measuring apparatus was assembled.
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Application onf the Focused Ion on Electron Beam in Nanotechnologies
Šamořil, Tomáš ; Mikulík, Petr (referee) ; Jiruše, Jaroslav (referee) ; Šikola, Tomáš (advisor)
Nowadays, the systems that allow simultaneous employment of both focused electron and ion beams are very important tools in the field of micro- and nanotechnology. In addition to imaging and analysis, they can be used for lithography, which is applied for preparation of structures with required shapes and dimensions at the micrometer and nanometer scale. The first part of the thesis deals with one lithographic method – focused electron or ion beam induced deposition, for which a suitable adjustment of exposition parameters is searched and quality of deposited metal structures in terms of shape and elemental composition studied. Subsequently, attention is paid also to other types of lithographic methods (electron or ion beam lithography), which are applied in preparation of etching masks for the subsequent selective wet etching of silicon single crystals. In addition to optimization of mentioned techniques, the application of etched silicon surfaces for, e.g., selective growth of metal structures has been studied. The last part of the thesis is focused on functional properties of selected 2D or 3D structures.
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Optical response of asymmetric plasmonic structures
Babocký, Jiří ; Kolařík, Vladimír (referee) ; Čechal, Jan (advisor)
This diploma thesis deals with study of resonance modes of plasmonic structures. First part provides an overview of theoretical models, which explain the resonanace modes in plasmonic structures. Next part describes technology of electron beam lithography. First section of experimental part deas with technological processes leading to an improvement of resulting structures made by electron beam lithography that is followed by lift-off process. Last part focuses on a study of reflectance spactra of plasmonic antenas and the identification of resonance modes.
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Creation of plasmonic micro- and nanostructures by electron beam lithography
Babocký, Jiří ; Dvořák, Petr (referee) ; Kvapil, Michal (advisor)
This beachelor’s thesis deals with a fabrication of plasmonic antennas using electron beam lithography. First section consists of summary of a technologies that can be used for production of metallic micro and nanostructures on silicon and glass substrate. Second section provides a description of electron beam lithography method and technologies that are used for it. Final part describes experiments, that were done and empiric model describing dependance of dimension of fabricated structures on lithographic parameters.
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