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Diagnostics of low-temperature plasma using the Langmuir and emissive probes
Klusoň, Jan ; Kudrna, Pavel (advisor) ; Tichý, Milan (referee)
Magnetron sputtering belongs to the most important methods of production of thin films with a wide range of physical properties. Examples include hard, wear-resistant coatings, low friction ones, corrosion resistant ones as well as coatings with specific electrical or optical properties. During the development the basic sputtering process has been significantly improved and nowadays there are a number of various techniques of magnetron sputtering. Pulsed magnetron sputtering presents one of these techniques. The pulsed regime is especially suitable for the deposition of insulating layers because there occurs no effect of charging up of the target followed by arc events. The fact that pulsed sputtering allows reducing the substrate temperature during the deposition is also important. This thesis deals with the low-temperature plasma in magnetron discharge generated by pulsed DC voltage. The measurement was carried out in the experimental apparatus of the cylindrical magnetron. The plasma diagnostics was performed by means of the electrostatic Langmuir and emissive probe. The dependencies of the basic plasma parameters, i.e. electron density, electron temperature and plasma potential, were evaluated with time and spatial resolution. The dependencies on pressure, length of the voltage pulse and the value of...
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Application of low temperature plasma jet systems for the deposition of thin films
Hubička, Zdeněk ; Kment, Štěpán ; Olejníček, Jiří ; Čada, Martin ; Straňák, V. ; Klusoň, J. ; Tichý, M. ; Klusoň, Petr
The low pressure DC pulsed or RF pulsed modulated hollow cathode plasma jets worked on the principle of the reactive sputtering of the hollow cathode usually in the gas mixture of Ar + O2 or N2. The DC pulsed power supplier was applied with combination of the RF source for the plasma jets generation. It was clearly demonstrated that properties of TiO2 and TiO2:N films significantly depended on the plasma parameters. First, the produced films were characterized with the aid of a number of methods (AFM, SEM, XRD, Raman spectroscopy, X-ray photoelectron spectroscopy (XPS), UV–vis spectrometry). Further, the films were judged in terms of their specific optical functionality to generate photocurrents upon being illuminated with spectrally well defined narrow light beams. The parameters of the chemically reactive plasma in the jets were determined using the time-resolved Langmuir probe system. The measurement of the ion energy distribution function was performed by means of the RFA.
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Pojišťovnictví v oblasti strojního zařízení
Klusoň, Jan
This bachelor thesis in its theoretical part describes basic terms in insurance system and different kinds of insurance. In its practical part the thesis covers the specifics of machinery insurance. The main practical goal is to compare possibilities of insuring a selected piece of agriculture machinery on a Czech market. The thesis also compares the possibilities of risk coverage on the Czech insurance market, the specifics and a range of risk coverage and individual causes of payment refusal of the insured events.
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The investigation of low pressure HCPJ system for Ti02 film deposition
Perekrestov, Roman ; Kudrna, Pavel (advisor) ; Klusoň, Jan (referee) ; Straňák, Vítězslav (referee)
Title: The investigation of low pressure HCPJ system for TiO2 film deposition Author: Mgr. Roman Perekrestov Department / Institute: Department of Surface and Plasma Science Supervisor of the doctoral thesis: doc. Mgr. Pavel Kudrna, Dr. Abstract: Plasma sources are widely used for deposition of thin films for both commercial solutions as well as for research purposes. In particular, information about plasma parameters in such systems is of a great importance not only to ensure reproducibility, but also for the targeted influence on properties of deposited thin films. The aim of the dissertation was the study of plasma parameters with respect to the growth and properties of thin films deposited by means of HCPJ sputtering system. The investigated plasma system was plasma jet powered in DC mode. The diagnostics of the discharge was carried out by means of a cylindrical Langmuir probe, quadrupole mass and optical spectrometer. Neutral gas temperature in discharge was measured by an optic-fibre thermometer. The growth of nanoparticles in a gas phase was studied using scattering of laser beam light. For the diagnostics of Ti/TiO2 thin films were used XPS, SEM, AFM, TEM, XRD and EDX methods. The photovoltaic performance of TiO2 thin films was tasted in dye-sensitized solar cells. Keywords: plasma jet, Langmuir...
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Pulsed plasma systems
Klusoň, Jan ; Kudrna, Pavel (advisor) ; Krčma, František (referee) ; Čada, Martin (referee)
The doctoral thesis deals with the experimental study of the low-temperature plasma designated for the preparation of thin films using the method of physical sputtering. It describes measurements which were realized on two types of devices - on the low-pressure plasma jet sputtering system and on the planar magnetron. The plasma diagnostics in the discharge excited in the pulse regime represent the main theme of the thesis. The discharge in the low-pressure plasma jet was studied by means of an electrostatic Langmuir probe, in the case of the planar magnetron, mass spectroscopy with energetic as well as time resolution was used. To understand the results achieved in the pulse generated plasma good knowledge of the basic continuous DC regime of the discharge excitation is essential. Therefore a considerable part of the thesis deals purely with the continuous DC discharge. In the case of the low- pressure plasma jet, the attention was focused also on the characteristic property of this plasma source, which is the flow from the jet.
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Studium parametrů plazmatu v plazmatické trysce
Štefániková, Estera ; Tichý, Milan (advisor) ; Klusoň, Jan (referee)
This thesis deals with the low-temperature plasma diagnostics by means of electrostatic Langmuir probe. The measurements were carried out on the experimental system of plasma jet which is very perspective mainly for the deposition of thin layers. Besides different resistant and industrial compelling surfaces there are also some layers with specific electrical or optical properties that cannot be prepared in other way. In order to control and reproduce such material depositions, the knowledge of plasma parameters is inevitable. The main contribution of this work lies in the measurement of vertical profiles of main plasma parameters (electron temperature, density and mean energy; the floating and plasma potential) in different pressure conditions.
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Diagnostics of low-temperature plasma using the Langmuir and emissive probes
Klusoň, Jan ; Kudrna, Pavel (advisor) ; Tichý, Milan (referee)
Magnetron sputtering belongs to the most important methods of production of thin films with a wide range of physical properties. Examples include hard, wear-resistant coatings, low friction ones, corrosion resistant ones as well as coatings with specific electrical or optical properties. During the development the basic sputtering process has been significantly improved and nowadays there are a number of various techniques of magnetron sputtering. Pulsed magnetron sputtering presents one of these techniques. The pulsed regime is especially suitable for the deposition of insulating layers because there occurs no effect of charging up of the target followed by arc events. The fact that pulsed sputtering allows reducing the substrate temperature during the deposition is also important. This thesis deals with the low-temperature plasma in magnetron discharge generated by pulsed DC voltage. The measurement was carried out in the experimental apparatus of the cylindrical magnetron. The plasma diagnostics was performed by means of the electrostatic Langmuir and emissive probe. The dependencies of the basic plasma parameters, i.e. electron density, electron temperature and plasma potential, were evaluated with time and spatial resolution. The dependencies on pressure, length of the voltage pulse and the value of...
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