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Controlled structuring of self-assembled polystyrene microsphere arrays by two different plasma systems
Domonkos, Mária ; Ižák, Tibor ; Stolcova, L. ; Proška, J. ; Kromka, Alexander
In this study we present a successful manipulation of microspheres by reactive ion etching (RIE). A self-assembled monolayer close-packed array of monodisperse polystyrene microspheres (PM) with diameter of 471 nm was used as the primary template. The PM templates were processed in two different RIE systems: (i) capacitively coupled radiofrequency plasma (CCP) and (ii) dual plasma system which combines CCP and pulsed linear-antenna microwave plasma (PLAMWP). The influence of process conditions on the PM geometry was systematically studied by scanning electron microscopy (SEM). It was found out that choosing optimal parameters results in a tunable diameter of PM with various shapes (from spheres to pyramid-like structures) while keeping their periodic hexagonal ordering.
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Applications of self-assembled 2D polystyrene nanosphere arrays
Domonkos, Mária ; Ižák, Tibor ; Demo, Pavel ; Kromka, Alexander
In this study nanosphere lithography (NSL) is demonstrated to be a low-cost, parallel and material independent fabrication process for creating periodic arrays of nanostructures using self-assembled nanospheres as templates. SA is the most feasible way to fabricate 2D or 3D colloidal crystals on large areas. After the mask preparation NSL uses different steps of plasma etching and deposition processes. The resulting patterned nanostructures have a wide range of applications in many important areas such as photonics, antireflection, surface wetting, biological and chemical sensing, solar cells, etc. This study focuses on an overview of applications of 2D colloidal crystals. First, structuring of substrate surfaces and the creation of various nano-objects (nanotips, nanopillars, nanocones) is shown. Next, direct growth of patterned structures (graphene nanomesh and diamond structures) is pointed out.
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Controlled structuring of self–assembled polystyrene microsphere arrays by two different plasma systems
Domonkos, Mária ; Ižák, Tibor ; Štolcová, L. ; Proška, J. ; Kromka, Alexander
In this study we present a successful manipulation of microspheres by reactive ion etching (RIE). A self-assembled monolayer close-packed array of monodisperse polystyrene microspheres (PM) with diameter of 471 nm was used as the primary template. The PM templates were processed in two different RIE systems: (i) capacitively coupled radiofrequency plasma (CCP) and (ii) dual plasma system which combines CCP and pulsed linear-antenna microwave plasma (PLAMWP). The influence of process conditions on the PM geometry was systematically studied by scanning electron microscopy (SEM). The process conditions were controlled by varying radiofrequency (RF) power, gas mixture (O2:CF4 ratio) and process duration.
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Reactive ion etching of polystyrene microspheres
Domonkos, Mária ; Ižák, Tibor ; Štolcová, L. ; Proška, J. ; Kromka, Alexander
This article gives a brief insight also into the principle of the nanosphere lithography and various plasma systems focusing on their properties and applicability for a subsequent topographical modification of surfaces prepared by NS lithography. In the experimental part of this study we present a successful manipulation of microspheres by reactive ion etching (RIE). A self-assembled monolayer close-packed array of monodisperse polystyrene microspheres is used as the primary template. The polystyrene microspheres (PM) were processed in capacitively coupled radiofrequency plasma (CCP) RIE system. The influence of process conditions on the PM geometry is systematically studied by scanning electron microscopy. The process conditions are controlled by varying radiofrequency power, total pressure, composition of the gas mixture (ratio O2:CF4) and process duration.
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Study of nucleation and growth of diamond thin films
Ižák, Tibor ; Babchenko, Oleg ; Varga, Marián ; Potocký, Štěpán ; Marton, M. ; Vojs, M. ; Domonkos, Mária ; Kromka, Alexander
This study deals with the nucleation and growth of CVD diamond films on Si substrates. In nucleation part two different nucleation methods were studied: (i) the bias enhanced nucleation (BEN) and (ii) ultrasonic seeding. In the case of BEN, (i) the nucleation time and (ii) the influence of bias voltage were studied. For ultrasonic seeding the effect of different solutions of ultradisperzed detonation nanodiamond (UDD) powder with metal particles on the nucleation efficiency and growth process was investigated (i.e. diamond powder, nanosized Ni, microsized Co and Y metal powders).
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Structuring of diamond films by reactive ion plasma etching
Domonkos, M. ; Ižák, Tibor ; Proška, J. ; Kromka, Alexander
In this study, two common strategies of diamond film structuring are described. Main focus is on the comparison of top-down and the bottom-up strategies. The top-down strategy is primary related to dry reactive ion etching through masking materials (or even without mask), while bottom-up strategy is based on selective area deposition of diamond film. Several methods of both strategies are demonstrated in details in the article, regarding to their properties and basic principles.
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