National Repository of Grey Literature 5 records found  Search took 0.01 seconds. 
Quantitative 2D dopant profiling in semiconductor by the secondary electron emission
Mika, Filip
The topic of work is study of semiconductor structure with defined doped areas by SEM with slow electrons, under ultra-high vacuum and standard vacuum conditions.The aim is to find optimal conditions of imaging doped areas and find out the dependence between contrast and doping density.
Scanning electron microscopy with low energy electrons
Mika, Filip
A method of scanning electron microscopy (SEM) of nonconductive specimens, based on measurement and utilisation of the critical energy of electron impact, is described in detail together with examples of its application. The critical energy, at which the total electron yield curve crosses the unit level, is estimated on the base of measurement of the time development in the image signal from beginning of irradiation. The method is programmed and implemented as a module to the controlling software of the micropscope type VEGA, where it secures fast search for the critical energy value.
Scanning electron microscopy with low energy electrons
Mika, Filip
A method of scanning electron microscopy (SEM) of nonconductive specimens, based on measurement and utilisation of the critical energy of electron impact, is described in detail together with examples of its applications. The critical energy, at which the total electron yield curve crosses the unit level, is estimated on the base of measurement of the time development in the image signal from beginning of irradiation. The method is programmed and implemented as a module to the controlling software of the microscope type VEGA, where it secures fast search for the critical energy value.
Tvorba kontrastu při zobrazení dopovaného polovodiče v nízkoenergiovém REM
Mika, Filip ; Frank, Luděk
Functional details of semiconductor structures keep decreasing in size. Among the structure elements the locally doped patterns play crucial role so that tools are needed for their observation. For fast diagnosis and quality check of the semiconductor structures the scanning electron microscope is useful because of its wide range of magnification, availability of different signal modes, speed of data acquisition and nondestructive nature of the technique in general, especially at low voltage operations. The dopant concentration in semiconductor is quantitatively determined via acquisition of signal of the secondary electron (SE) emission in such a way that the image contrast is measured between areas of different type or rate of doping

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