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What is the buzz about the TZ mode
Kolařík, Vladimír ; Matějka, František ; Matějka, Milan ; Horáček, Miroslav ; Urbánek, Michal ; Bok, Jan ; Krátký, Stanislav ; Král, Stanislav ; Mika, Filip
This contribution deals with an e-beam pattern generator BS 600 that works with a variable rectangular spot of electrons (stamp). The TZ stands for the ‘technology zoom’; its meaning is a reduction of the spot size by a factor of 3. Original description of the TZ exposure mode can be found in (1), [2] and [3]; further aspects concerning the exposure system and its electron source were described in [4] and [5]; technology and related topics are discussed in [6], [7], [8] and [9]; overview of application areas is in [10], [11] and [12]; and finally, very recent results are summarized in [13], [14] and [15].
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CAD v elektronové optice
Lencová, Bohumila
Invited talk on 8th Multinational congress on microscopy in the session Electron optics and optical elements. It discusses the themes of reduced interest in papers from electron optics on microscopy conferences and the progress in computational programs (such as EOD from ISI AS CR), in particular in accurate electron ray tracing in electromagnetic fields and in user interfaces.
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Coulombovské interakce v iontových a elektronových svazcích
Radlička, Tomáš
The article describes the approach and results of simulation of Coulomb interactions in ion and electron beams. The description of the ion beam in the vicinity of LMIS is presented including the effect on the energy and spatial distribution. The electron beam lithography is the second described system. We were interested in the effect of the coulomb interactions on the focusing of the beam.
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