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Thin Metallic Layers Structured by E-beam Lithography
Horáček, Miroslav ; Kolařík, Vladimír ; Urbánek, Michal ; Matějka, František ; Matějka, Milan
The group of electron beam lithography runs the laboratory equipped with a shaped beam electron writer (BS600) and the basic technology for the lithographic process. The group is able to prepare micro and nano structures in thin layers of metals and other materials; including the characterization of the realized structures (using AFM, SEM, and CLSM). Within a few months (in the frame of the 'ALISI' project) a new e-beam writer with a better resolution will be installed; it will enable the realization of the actual structures in a better quality and the development of new structures with a very high innovation potential.
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Films of Metal Nanoparticles Deposited on Semiconductors by Electrophoresis: Technology and Characterization
Žďánský, Karel ; Zavadil, Jiří ; Kacerovský, Pavel ; Kostka, František ; Lorinčík, Jan ; Černohorský, O. ; Fojtík, A. ; Müller, M. ; Kostejn, M.
Layers of nanoparticles in micelle enclosures were deposited on InP substrates by electrophoresis from isooctane colloid solutions containing Pd or Ag nanoparticles. The layers were investigated by SIMS, low-temperature photoluminescence spectroscopy and topography, absorption spectroscopy, Raman spectroscopy and sensitivity to hydrogen. Photoluminescence of InP was enhanced by the layers of Pd or Ag nanoparticles. Schottky barriers made on the n-type InP with layers containing Pd nanoparticles showed significant sensitivity to hydrogen in contrast to those containing Ag nanoparticles.
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