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Application of low temperature plasma jet systems for the deposition of thin films
Hubička, Zdeněk ; Kment, Štěpán ; Olejníček, Jiří ; Čada, Martin ; Straňák, V. ; Klusoň, J. ; Tichý, M. ; Klusoň, Petr
The low pressure DC pulsed or RF pulsed modulated hollow cathode plasma jets worked on the principle of the reactive sputtering of the hollow cathode usually in the gas mixture of Ar + O2 or N2. The DC pulsed power supplier was applied with combination of the RF source for the plasma jets generation. It was clearly demonstrated that properties of TiO2 and TiO2:N films significantly depended on the plasma parameters. First, the produced films were characterized with the aid of a number of methods (AFM, SEM, XRD, Raman spectroscopy, X-ray photoelectron spectroscopy (XPS), UV–vis spectrometry). Further, the films were judged in terms of their specific optical functionality to generate photocurrents upon being illuminated with spectrally well defined narrow light beams. The parameters of the chemically reactive plasma in the jets were determined using the time-resolved Langmuir probe system. The measurement of the ion energy distribution function was performed by means of the RFA.
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