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Interferometric coordinates measurement sytem for local probe microscopy nanometrology
Hrabina, Jan ; Lazar, Josef ; Klepetek, P. ; Číp, Ondřej ; Čížek, Martin ; Holá, Miroslava ; Šerý, Mojmír
We present an overview of new approaches to the design of nanometrology measuring system with a focus on methodology of nanometrology interferometric techniques and associated problems. The design and development of a nanopositioning setup with interferometric multiaxis monitoring and control involved for scanning probe microscopy techniques (primarily atomic force microscopy, AFM) for detection of the sample profile is presented. Coordinate position sensing allows upgrading the imaging microscope techniques up to quantified measuring. Especially imaging techniques in the micro- and nanoworld overcoming the barrier of resolution given by the wavelength of visible light are a suitable basis for design of measuring systems with the best resolution possible. The system is being developed in cooperation with the Czech metrology institute and it is intended to operate as a national nanometrology standard combining local probe microscopy techniques and sample position control with traceability to the primary standard of length.
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Precision displacement interferometry with stabilization of wavelength on air
Lazar, Josef ; Holá, Miroslava ; Hrabina, Jan ; Buchta, Zdeněk ; Číp, Ondřej
We present an interferometric technique based on differential interferometry setup for measurement in the subnanometer scale in atmospheric conditions. The motivation for development of this ultraprecise technique is coming from the field of nanometrology. The key limiting factor in any optical measurement are fluctuations of the refractive index of air representing a source of uncertainty on the 10'6 level when evaluated indirectly from the physical parameters of the atmosphere. Our proposal is based on the concept of overdetermined interferometric setup where a reference length is derived from a mechanical frame made from a material with very low thermal coefficient on the 1 O'8 level. The technique allows to track the variations of the refractive index of air on-line directly in the line of the measuring beam and to compensate for the fluctuations. The optical setup consists of three interferometers sharing the same beam path where two measure differentially the displacement while the third represents a reference for stabilization of the wavelength of the laser source. The principle is demonstrated on an experimental setup and a set of measurements describing the performance is presented.
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Nanometrology coordinate measurement machines uncertainties caused by frequency fluctuations of the laser
Hrabina, Jan ; Lazar, Josef ; Číp, Ondřej
One of considerable sources of displacement measurement uncertainty in nanometrology systems such as multidimensional interferometric positioning for local probe microscopy is the influence of amplitude and especially frequency noise of a laser source which powers the interferometers. We investigated the noise properties of several laser sources suitable for interferometry for micro- and nano-CMMs (coordinate measurement machines) and compared the results with the aim to find the best option. The influences of amplitude and frequency fluctuations were compared together with the noise and uncertainty contributions of other components of the whole measuring system. Frequency noise of investigated laser sources was measured by two approaches – at first with the help of frequency discriminator (Fabry-Perot resonator) converting the frequency (phase) noise into amplitude one and then directly through the measurement of displacement noise at the output of the interferometer fringe detection and position evaluation. Both frequency noise measurements and amplitude noise measurements were done simultaneously through fast and high dynamic range synchronous sampling to have the possibility to separate the frequency noise and to compare the recorded results.
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Differential interferometry with suppression of the influence of refractive index of air for nanometrology
Holá, Miroslava ; Číp, Ondřej ; Hrabina, Jan ; Buchta, Zdeněk ; Lazar, Josef
We present an interferometric technique based on differential interferometry setup for measurement in the subnanometer scale in atmospheric conditions. The motivation for development of this ultraprecise technique is coming from the field of nanometrology. The key limiting factor in any optical measurement are fluctuations of the refractive index of air representing a source of uncertainty on the 1*E-6 level when evaluated indirectly from the physical parameters of the atmosphere. Our proposal is based on the concept of overdetermined interferometric setup where a reference length is derived from a mechanical frame made from a material with very low thermal coefficient on the 1*E-8 level. The technique allows to track the variations of the refractive index of air on-line directly in the line of the measuring beam and to compensate for the fluctuations. The optical setup consists of three interferometers sharing the same beam path where two measure differentially the displacement while the third evaluates the changes in the measuring range acting as a tracking refractometer. The principle is demonstrated on an experimental setup and a set of measurements describing the performance is presented.
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Interferometer controlled positioning for nanometrology
Lazar, Josef ; Číp, Ondřej ; Čížek, Martin ; Hrabina, Jan ; Šerý, Mojmír ; Klapetek, P.
We present a system for dimensional nanometrology based on scanning probe microscopy techniques (primarily atomic force microscopy, AFM) for detection of sample profile combined with interferometer controlled positioning. The interferometric setup not only improves resolution of the position control but also ensures direct traceability to the primary etalon of length. The system was developed to operate at and in cooperation with the Czech metrology institute for calibration purposes and nanometrology. The interferometers are supplied from a frequency doubled Nd:YAG laser stabilized by linear absorption spectroscopy in molecular iodine and the interferometric configuration controls the stage position in all six degrees of freedom.
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Absolutní frekvenční posuvy jodem stabilizovaných laserových etalonů zpusobené čistotou jodu absorpčních kyvet
Hrabina, Jan ; Jedlička, Petr ; Číp, Ondřej ; Lazar, Josef
Jodem stabilizované Nd:YAG lasery představují ve spojení se syntezátory optických kmitočtů prostředek k realizaci optických hodin, zařízení dovolujícího dosažení stability optické frekvence stabilizovaného laseru do radiofrekvenčního pásma. V této práci prezentujeme výsledky měření čistoty jodu v absorpčních kyvetách vyrobených na našem ústavu. Čistota byla testována zdokonalenou metodou založenou na indukované fluorescenci s výpočtem Sternovy-Volmerovy formule. Zdokonalení sestavy spočívalo v zařazení prvků ke kompenzaci modových a výkonových nestabilit budicího laseru. Dále byly přímým frekvenčním srovnáváním změřeny absolutní frekvence vybraných hyperjemných jodových přechodů Nd:YAG laseru stabilizovaného pomocí jodových absorpčních kyvet s reprodukovatelností měření pod úrovní 1 kHz. Výsledky obou metod spolu dobře korelují a byly použity ke zdokonalení technologie výroby kyvet na našem ústavu.
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