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Deposition of Ga and GaN ultrathin layers on graphene substrate
Dvořák, Martin ; Nebojsa, Alois (referee) ; Mach, Jindřich (advisor)
This diploma thesis deals with preparation of graphene samples for depositions of ultrathin layers of gallium and gallium nitride. Graphene substrates were prepared by chemical vapour deposition in home-build high temperature reactor. After graphene transfer to silicon wafers, a series of chemical and thermal treatments were performed. Obtained samples were suitable for the study of growth of ultrathin layers of Ga and GaN. The growth of Ga and GaN was realized in ultra high vacuum conditions. Molecular beam epitaxy technique was used for gallium depositions together with ion source for nitridation. Obtained ultrathin layers were studied with X-ray photoelectron spectroscopy, atomic force microscopy and with scanning electron microscopy.
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Design of the atomic source producing carbon beams for deposition of graphene in UHV conditions
Horáček, Matěj ; Kolíbal, Miroslav (referee) ; Mach, Jindřich (advisor)
This bachelor's thesis deals with the design of the atomic source of carbon beams for deposition of graphene in UHV conditions. In the first part, problems on the growth of ultrathin layers, the theory of atomic beams and molecular beam epitaxy are described. The second part is aimed to graphene layers - especially the growth of graphene using molecular beam epitaxy. In the third part, the detection of carbon atomic beams is discussed. The practical part of this bachelor's thesis deals with the design and the construction of high-temperature atomic source of carbon. In the conclusion the obtained results are discussed.
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Optimization of the radiofrequency atomic source for deposition of GaN
Kern, Michal ; Wertheimer, Pavel (referee) ; Mach, Jindřich (advisor)
This thesis is focused on construction and optimization of radiofrequency atomic dissociation source of atomic nitrogen for depostion of GaN. The theoretical part deals with atomic sources, growth of ultrathin layers and the issue of radiofrequency circuits, with emphasis on their design using Smith chart. Methods for synthesis of GaN ultrathin layers and deposition are also discussed. In the experimental part, design and realization of various congurations of the impedance matching network is described. Using the impedance matching network a nitrogen plasma discharge was successfuly created and its spectrum was analysed. Afterwards, design and realization of a stepper motor control for the impedance matching network is described.
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Preparation and analysis of nanostructures in UHV conditions
Gloss, Jonáš ; Spousta, Jiří (referee) ; Mach, Jindřich (advisor)
Cílem této bakalářské práce bylo skoumání přípravy a analýzy nanostruktur v podmínkách vysokého vakua (VV). Teoretická část klade důraz na gallium nitridové (GaN) nanostruktury. Ty pak byly analyzovány rastrovacím tunelovacím mikroskopem (RTM). Aby bylo možné analyzovat připravené vzorky ve VV RTM, bylo provedeno elektrochemické leptání wolfrámového drátu. Tato práce zhrnuje postup k vytvoření wolfrámových hrotů pro RTM. Kapitola o výrobě wolfrámových hrotů zahrnuje popis princípu elektrochemického leptání. Obrázky vyleptaných hrotů byly provedeny pomocí rastrovacího elektronového mikroskopu. Zaostřování hrotů pak bylo vykonáno fokusovaným iontovým svazkem. V této práci je také představena metoda pro opětovné ostření RTM hrotů elektronovým svazkem, vykonávaná in-situ. Bylo dokázáno, že je možné rutinně obdržet wolfrámové hroty s poloměrem křivosti rádovo v nanometrech.
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The photoluminescence properties measurement of ultrathin films
Metelka, Ondřej ; Mach, Jindřich (referee) ; Šamořil, Tomáš (advisor)
The thesis briefly describes the principles and types of luminescence. In the first following research of study is also discussed the equipment which is applicable to photoluminescence experiments, including the arrangement. The second research focuses on the influence of the properties of gallium nitride (GaN) (ultra) thin films and other structures prepared by various ways on shape of photoluminescence spectra. The paperwork also describes the further optimization of photoluminescent apparatus used for the measurement of photoluminescence spectrum in the UV light radiation which is located at the Institute of Physical Engineering at the Technical University. The extension of measurements at low temperatures (design and construction of its own cryostat) is added. The conclusion concernes the test measurements to determine the effect of various settings of the apparatus on the resulting measured photoluminescence spectrum.
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Growth ultrathin of layers Au
Beránek, Jiří ; Kolíbal, Miroslav (referee) ; Mach, Jindřich (advisor)
The aim of this thesis is to study growth of ultrathin gold layers prepared by MBE (Molecular beam epitaxy) in UHV conditions. Differently modified sillicon served as a substrate and depositions were done at different temperatures of a substrate. Samples were analyzed by ToF LEIS for thickness, morfology was examined by SEM and AFM. X-ray photoelectron spectra were taken for chemical analysis. Gathered data together with their evaluation contribute to description and understanding of some processes during deposition and subsequent exposure of the sample to high temperatures. Experimental data and conslusions also prowide basis for further experiments and development of potential applications.
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Preparation of SiN ultrathin films
Dvořák, Martin ; Voborný, Stanislav (referee) ; Mach, Jindřich (advisor)
This bachelor´s thesis deals with design, testing and calibration of an effussion cell generating silicon atomic beam having thermal energy (0,1 - 1 eV). These beams are used for the preparation of Si and SiN ultrathin films. Silicon nitride and its applications in semiconductor industry are reviewed. First experiments with deposition of ultrathin films of Si and SiN are described. These layers have been analyzed by x-ray photoelectron spektroscopy (XPS) and atomic force microscopy (AFM).
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Preparation of Ag/Co/Ag Trilayers
Burda, Pavel ; Kolíbal, Miroslav (referee) ; Čechal, Jan (advisor)
The Bachelor's thesis is aimed to the preparation of silver and cobalt ultrathin films. The films are formed on modified surfaces of crystalline silicon substrates (SiO2/Si(111), Si(111) ?H, Si(111) 7×7) and amorphous SiO2 in a form of a quartz glass. Thin films are grown using an effusion cell for Molecular Beam Epitaxy (MBE). Surface modified surfaces are covered subsequently by a silver, cobalt and silver thin layer. The individual film thickness is 6 nm. Consequently the samples are studied by the X-ray Photoelectron Spectroscopy (XPS) and the Atomic Force Microscopy (AFM). The morphology of thin films and growth modes are compared among the substrates. Growth modes change with the surface modification type. Complete trilayer system Ag/Co/Ag was prepared on SiO2/Si(111) and Si(111) 7×7. Such system can be employed in plasmonics in order to allow the control of surface plasmon polariton properties by an external magnetic field.
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