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Sondová diagnostika nízkoteplotního plazmatu při depozičním procesu
KOZLOVÁ, Miroslava
This master thesis deals with examination of the parameters of low temperature plasma which is used for the deposition of thin layer of ITO. The method which is used in this thesis is the probe diagnostics. This thesis is divided into two parts. The first is the theoretical part, in which the basic parameters of low temperature plasma, principles of the probe diagnostics, and theories for this method are explained. The second part is the practical part, which presents the results of the measurement depending on changes in conditions of deposition.
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Low power MEMS heating membrane
Svatoš, Vojtěch ; Pekárek, Jan (referee) ; Hubálek, Jaromír (advisor)
The aim of this thesis is to create the MEMS heating membrane with low power consumption. This work includes the main of design and fabrication processes of these heating elements. It was decided that the final sample will be created as suspended membrane type of the structure. It the end of the thesis there is detailed overview of the whole fabrication processes used for fabrication of final samples and the experiment to prove the resistance due to thermal stress.
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Automation and control of multilayers deposition by IBS/IBAD
Pavera, Michal ; Sobota, Jaroslav (referee) ; Urbánek, Michal (advisor)
This diploma thesis deals with the automation of the deposition process by ion beam sputtering and ion beam assisted deposition. This work contains drawings of mechanical adjustments of the deposition chamber designed to control shutter and rotation of the target using stepper motors. There are presented ways to control stepper motors and troubleshoot their exact settings. Another task is to design a system for computer control of the deposition process. There are discussed ways to control the ion sources, pressure meter, flow meter and thickness meter, and their connection to a PC via RS-232 and analog-digital converters. It is also designed control program in LabVIEW, which allow automated multilayer deposition. Last part of the thesis deals with testing automatic deposition and results are commented.
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Diagnostics of thin layer deposition using tetravinylsilane monomer
Flamíková, Kristýna ; Dvořák,, Pavel (referee) ; Krčma, František (advisor)
The aim of this work is plasma diagnostic during the deposition of thin films based on organosilicone compounds. These layers have a wide range of applications mainly as protective coatings or intermediate phase in composites reinforced by glass fibers. The theoretical part of this work gives a basic fundaments of optical emission spectroscopy and mass spectroscopy and describes procedures for rotational, vibrational, and electron temperature calculations. The RF capacitive coupled discharge in configuration with planar electrodes was used with tetravinylsilane (TVS) organosilicone monomer in this study. The optical emission spectroscopy and mass spectroscopy were applied for the plasma diagnostics. The deposition process was carried out in continuous regime with applied power of 20, 25, 40, 50, 60, and 70 W, some experiments were done also in pulsed regime with duty cycle 1:1, 1:4 and 1:9 at fixed power of 50 W and 10 W when discharge was on. The atomic lines of hydrogen Balmer series and many rotational lines of molecular hydrogen were identified in the spectra. Besides them, the molecular bands of SiH, CH and C2 species were observed. The rotational temperature calculated from 0-0 CH band was in the range of 600 – 1000 K depending on the discharge conditions. The electron temperature in the range of 3600-7500 K was calculated from hydrogen atomic lines. In situ mass spectra collected simultaneously with optical emission spectra showed TVS monomer fragmentation increase with the increase of applied power in continuous regime. This result well correlated with OES in case of CH radical and hydrogen species, the other particles were mainly non-measurable by emission spectroscopy. The same results were also obtained with respect to the duty cycle parameter. The presented results clearly demonstrated the increase of monomer fragmentation with the increase of mean applied discharge power. Determination of prepared layer properties is a subject of other works and their relation to the plasma parameters will be a subject of further studies.
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Diagnostics of thin layer deposition using dimethylphenylsilane monomer
Procházka, Michal ; Kudrle, Vít (referee) ; Krčma, František (advisor)
The aim of this thesis is a study of processes during organosilicone thin film deposition via plasma polymerization. Recently, thin films are the most expanding way of surface modification of materials. They are used as protective coatings, functional layers, they can increase or decrease adhesion to different compounds (e.g. water), or just improve mechanical properties of bulk materials. Plasma polymers, which are not known so long, are a modern trend in evolution of thin film deposition. They have perfect adhesion to the substrate and they are highly resistant against most of chemical compounds. Their structure is quite different from the structure of classical polymers. Recently, organosilicon compounds are used as precursors for plasma polymers because silicon built in the structure of plasma polymer allows thin film deposition on glass substrate and the organic part of monomer gives us infinite possibilities of modification. In our case dimethylphenylsilane (DMPS) was used as a monomer. Various RF low pressure discharges were used during this study. Plasma diagnostic was performed by optical emission spectroscopy of inductive coupled plasma. This method allows us to determine plasma composition during the deposition process. Thus we can predict the composition of deposited thin film according to input parameters. From relative populations of fragments we are able to find out optimal conditions for deposition process. We can also calculate temperature of particles in plasma which gives us some information about particle energies. The first part of the study deals with the identification of particles (fragments) created by fragmentation of monomer in plasma environment. We successfully identified hydrogen atomic lines of Balmer’s series in the spectra. Many rotational lines of hydrogen molecule were also detected. Atomic carbon occurred only in small amount. Much more carbon was detected in the form of CH radical. We also found some weak lines connected to atomic silicon. When we used a mixture of DMPS and oxygen, OH radical and O2+ were present in spectra. Next, optimal settings of deposition were determined for particular fragments from relative intensities of these fragments in optical emission spectra. Using this information we are able to set up the process to deposit thin films of desired composition and properties. We calculated electron temperature from intensities of hydrogen lines in Balmer’s series. Rotational temperature was obtained from CH radical intensity. Unfortunately, there was no convenient radical from which intensity we would be able to calculate vibrational temperature. All results and information obtained during the research can be used in industrial plasma polymerization processes and development of new coatings and functional thin films. Other studies on DMPS or similar monomer may also be realized to get more knowledge about processes in plasma and this thesis could serve as a basis for further research. Moreover, this study is a part of an international project. The aim of this project is to study processes during plasma polymerization both theoretically and practically. Once finished, the project and its results will be presented in scientific literature and at international conferences.
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The deposition of thin films by the ion sputtering IBS/IBAD
Hudeček, Jan ; Pavera, Michal (referee) ; Dvořák, Petr (advisor)
The submitted bachelor’s thesis are dealed with concept and design of holder of new palette, which is determine for deposition equipment, which belongs to institue of physical engineering and which is called as Kaufmann. Introductory chapters of bachelor’s thesis deals about possibilities of production of thin films, ways of growth of thin films and introduction to vakuum physics. Next chapter is given to current deposition and current deposition equipment Kaufmann. In the next chapter are descriptions of construct solution of holder of new palette and construct solution of palette. The last chapter is given to calibration and optimalization of deposition with new palette.
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Computer control of the deposition process
Pavera, Michal ; Voborný, Stanislav (referee) ; Urbánek, Michal (advisor)
This bachaloers thesis deals with automation of the deposition process of the ultrathin layers by IBAD method. One of the tasks is to design motorized target and shutter manipulator. The thesis therefore contain drawings of these manipulators. Which enable their control by stepper motors. Second task is to design of electronics and program control of primary and secondary ion source. In this part is described connection of the system with the computer using AD/DA converters and the appropriate programming. Last part of the thesis deals with differences between automated and manual control of the system, their advantages and disadvantages.
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Study of processes during the organosilicone thin films deposition
Flamíková, Kristýna ; Rašková, Zuzana (referee) ; Krčma, František (advisor)
The aim of this work is plasma diagnostic during the deposition of thin films based on organosilicone compounds. Tetravinylsilane (TVS) was used in this study; the optical emission spectroscopy was applied for the diagnostics. The theoretical part of this work gives a basic fundaments of optical emission spectroscopy and brings the procedures for rotational, vibrational, and electron temperature calculations. The deposition process was carried out in pulsed regime with duty cycle 1:4 to 1:499. The pure TVS and TVS containing 10, 40 and 80 % with total gas mixture flow rate of 0.5 sccm were used during the deposition. The hydrogen atomic lines and many rotational lines of molecular hydrogen were identified in the spectra. Besides them, the molecular band of SiH, CH and C2 were observed. The atomic oxygen lines and continuum with a maximum at 550 nm were recorded in the case when oxygen was added. The rotational temperature calculated from 0-0 CH band was in the range 1700 - 2100 K depending on the discharge conditions. The electron temperature of about 1800 K was calculated from hydrogen atomic lines. The experimental results showed the partial plasma composition and some plasma basic characteristics were obtained.
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Plasma discharge generated by surfatron with frequency 2,45 GHz
HOUSER, František
This diploma thesis deals mainly with utilization of plasma in technological aplications. The introductory part is apllied to the theoretical description of plasma generated by the surfatron. This launcher works with the frequency of 2,45 GHz and it is able to excite the surface wave, that sustains plasma column in a quartz tube. Plasma generated by surfatron was used for modification of surface properties of polyethylen to change its surface energy. By changing of surface energy it was reached of higher hydrophilicity. Plasma generated by surfatron was diagnosed in detail during experiments in a continual regime as well as in a pulse one with a help of a single {--} probe and a double {--} probe Langmuir measurement. In this diploma thesis there is discussed influence of pressure, power and other experimental options.
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