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Application of metallic materials for selective growth
Němeček, Tomáš ; Rezek, Bohuslav (referee) ; Čechal, Jan (advisor)
The Si(100) surface and Ga surface phases up to 1 ML on their oxidation have been studied by XPS and LEED. The selective growth of Ga on the SiO2/Si structures fabricated by EBL has been analyzed using SEM and AFM methods. It was proved that Ga clusters grow in structures beside the oxide. The structure of alumina on Ni3Al(111) and NiAl(110) substrates was fully determined by combining the results of STM measurements and DFT simulations. It was determined the alumina/NiAl(110) does not form a suitable template for ordered Fe and Co clusters growth. However, the next research confirmed the alumina/Ni3Al(111) forms template appropriate to clusters growth purpose.
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Sequential growth of GaN nanocrystals on SiO2 substrate modified by FIB method
Flajšmanová, Jana ; Voborný, Stanislav (referee) ; Mach, Jindřich (advisor)
This bachelor's thesis deals with the selective growth of gallium (Ga) and gallium nitride (GaN). In theoretical part, there is a brief description of growth of ultrathin films with respect to GaN and their manufacturing. Experimental part is aimed to the deposition of Ga and GaN on silicon substrates Si(1 1 1). Substrates with the native silicon dioxide layer (SiO2) were modified by focused ion beam (FIB). GaN was deposited by pulsed deposition followed by postnitridation. Prepared samples were studied by atomic force microscope (AFM), X-ray photoelectron spectroscopy (XPS) and scanning electron microscope (SEM).
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Selective growth of GaN layers on substrate modificated by method FIB
Mareš, Petr ; Voborný, Stanislav (referee) ; Mach, Jindřich (advisor)
The thesis deals with the selective growth of GaN crystals on the SiO2 layer. The theoretical part discusses the type of growth of ultrathin layers with focus on gallium nitride and its manufacturing. Moreover the text deals with principles of the focused ion beam and basic principles of other further methods which were used for analyzing the samples (AFM, XPS, photoluminescence spectroscopy). Experimental part consists of depositions of GaN. The silicon wafer Si(111) with native oxide SiO2 (1-2 nm) was used as a substrate. Focused ion beam was utilized to manufacture suitable structures on the substrate. Selective growth was acomplished with the use of the postnitridation method. Method of the pulse deposition was introduced with focus on increasing the volume of crystals.
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Selective growth of GaN on SiN
Hulva, Jan ; Kolíbal, Miroslav (referee) ; Mach, Jindřich (advisor)
This bachelor's thesis deals with the selective growth of gallium and gallium nitride on silicon nitride (SiN) substrates. Thin silicon nitride layers are deposited on silicon substrates. Oxide structures are prepared by the local anodic oxidation method (LAO) on SiN substrates. These surfaces can be editionally modified by etching in hydrofluoric acid. Modified substrates are used for the deposition of gallium or gallium nitride under ultra-high vacuum conditions. Consequently, ordering of deposited material was studied in areas modified by LAO. Chemical state of layers is studied by X-ray photoelectron spectroscopy. Morphology of surfaces is measured by the atomic force microscope (AFM).
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