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Characterisation of InAs/GaAs quantum dots by high resolution transmission electron microscopy
Zíková, Markéta ; Hospodková, Alice ; Pangrác, Jiří ; Hulicius, Eduard ; Komninou, Ph. ; Kioseoglou, J.
The InAs/GaAs quantum dots (QDs) covered by GaAsSb strain reducing layer (SRL) have suitable properties for various applications. The GaAsSb SRL covering InAs QDs is used to improve the structure growth and the final parameters like QD density, QD size or photoluminesence. To obtain high-quality structure with required properties, the structure growth and final structure have to be deeply studied. Since the QDs and SRL system is surrounded by GaAs, the high resolution transmission electron microscopy (HRTEM) measurement was used to reveal the real material arrangement in a prepared sample. In this work we will discuss the results of following HRTEM measurements: flatness and thickness of prepared layers, QD size, atomic arrangement and composition of GaAsSb layer.
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GaAsSb strain reducing layer covering InAs/GaAs quantum dots
Zíková, Markéta ; Hospodková, Alice ; Pangrác, Jiří ; Oswald, Jiří ; Kubištová, Jana ; Hulicius, Eduard ; Komninou, Ph. ; Kioseoglou, J. ; Nikitis, F.
GaAsSb is often used as a capping material for InAs quantum dots (QDs) due to its suitable conduction band alignment and suppression of In segregation from QDs during the capping process.We have found out that during the GaAsSb layer growth, Sb atoms segregate above InAs QDs, which is proved by the AFM and HRTEM measurements. For higher amount of Sb in GaAsSb, the measured photoluminescence (PL) has longer wavelength, but if it is too high, the structure may become type II with decreased PL intensity. For thick GaAsSb layer, the PL intensity decreases, because only big QDs participate to the PL.
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