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Deterministicky aperiodické obrazové zařízení
Horáček, Miroslav ; Meluzín, Petr ; Krátký, Stanislav ; Knápek, Alexandr ; Mika, Filip ; Chlumská, Jana ; Matějka, František ; Král, Stanislav ; Brunn, Ondřej ; Giričová, D. ; Kopal, Jaroslav ; Kolařík, Vladimír
Příspěvek se týká analýzy, návrhu a přípravy difrakčního opticky variabilního obrazového zařízení tvořeného deterministicky aperiodickou sítí základních optických prvků. Teoretický základ je doplněn numerickou analýzou a prezentací realizované matrice a jejích replik.
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Monte-Carlo simulation of proximity effect in e-beam lithography
Urbánek, Michal ; Kolařík, Vladimír ; Krátký, Stanislav ; Matějka, Milan ; Horáček, Miroslav ; Chlumská, Jana
E–beam lithography is the most used pattern generation technique for academic and research prototyping. During this patterning by e–beam into resist layer, several effects occur which change the resolution of intended patterns. Proximity effect is the dominant one which causes that patterning areas adjacent to the beam incidence point are exposed due to electron scattering effects in solid state. This contribution deals with Monte Carlo simulation of proximity effect for various accelerating beam voltage (15 kV, 50 kV, 100 kV), typically used in e–beam writers. Proximity effect simulation were carried out in free software Casino and commercial software MCS Control Center, where each of electron trajectory can be simulated (modeled). The radial density of absorbed energy is calculated for PMMA resist with various settings of resist thickness and substrate material. At the end, coefficients of proximity effect function were calculated for beam energy of 15 keV, 50 keV and 100 keV which is desirable for proximity effect correction.
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