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Fabrication of well defined nanoporous structures with application in membrane sensing
Fabianová, Kateřina ; Édes, Zoltán (referee) ; Sadílek, Jakub (advisor)
Theme of this bachelor thesis is focused on preparation of the metal nanomenhir structures situated in highly oriented matrix of silicon nitride nanopores based plasmonic biosensor. Porous structures were prepared by reactive ion etching of silicon nitride film using electron beam lithography prepared temporary mask as a template. Deposition of metals was handled by evaporation and magnetron sputtering and results was compared. Finally, this work assumes reached results including successful approach of sensor preparation without contamination of surrounding surface by heavy metal ions.
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Fabrication of graphene mid-infrared biosensor
Gallina, Pavel ; Hrabovsk, Milo (referee) ; Sadlek, Jakub (advisor)
The main subject of this bachelor's thesis was fabrication and measurement of response of graphene plasmonic biosensor prepared on flat and curved surfaces. Graphene produced by chemical vapour deposition (CVD) method was used for preparation of these sensors. The structures were fabricated using electron beam (EBL) and optical lithography, reactive ion etching (RIE) and magnetron sputtering. The resultant sensors were then observed in electron (SEM) and optical microscope, the topography was surveyed in atomic force microscope (AFM) and the measurement was carried out by Fourier transform infrared spectoscopy (FTIR).
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Application onf the Focused Ion on Electron Beam in Nanotechnologies
Šamořil, Tomáš ; Mikulík, Petr (referee) ; Jiruše, Jaroslav (referee) ; Šikola, Tomáš (advisor)
Nowadays, the systems that allow simultaneous employment of both focused electron and ion beams are very important tools in the field of micro- and nanotechnology. In addition to imaging and analysis, they can be used for lithography, which is applied for preparation of structures with required shapes and dimensions at the micrometer and nanometer scale. The first part of the thesis deals with one lithographic method – focused electron or ion beam induced deposition, for which a suitable adjustment of exposition parameters is searched and quality of deposited metal structures in terms of shape and elemental composition studied. Subsequently, attention is paid also to other types of lithographic methods (electron or ion beam lithography), which are applied in preparation of etching masks for the subsequent selective wet etching of silicon single crystals. In addition to optimization of mentioned techniques, the application of etched silicon surfaces for, e.g., selective growth of metal structures has been studied. The last part of the thesis is focused on functional properties of selected 2D or 3D structures.
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Application of Graphene Membrane in Nanoelectronic Devices
Kormoš, Lukáš ; Drbohlavová, Jana (referee) ; Bartošík, Miroslav (advisor)
This diploma thesis is focused on the applications and fabrication of graphene membrane from graphene prepared by the chemical vapor deposition. Theoretical part deals with transport properties of the graphene and multiple scattering processes limiting the charge carrier mobility in this material. Included is short review of graphene membrane applications. Experimental part provides fabrication process for achieving suspended graphene device by utilizing electron beam lithography, focused ion beam, chemical etching and patterning of graphene. Graphene membrane is characterized by transport properties measurement and compared to non-suspended graphene.
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Characterization of structures fabricated by selective wet etching of silicon
Metelka, Ondřej ; Mikulík, Petr (referee) ; Šamořil, Tomáš (advisor)
The task of master’s thesis was to perform optimalization process for preparing metal etching mask by electron beam litography and subsequent selective wet ething of silicon with crystalographic orientation (100). Further characterization of etched surface and fabricated structures was performed. In particular, attention was given to the morphology demonstrated by scanning electron microscopy and study changes of the optical properties of gold plasmonic antennas due to their undercut.
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Graphene-on-silicon Schottky junction solar cells
Zahradníček, Radim ; Drbohlavová,, Jana (referee) ; Mach, Jindřich (advisor)
This diploma thesis concerns itself with fabrication and characterization of Schottky solar cell on the graphene/silicon interface. Schottky solar cells were manufactured using a front collector electrode from gold, silver and carbon. On the graphene/silicon interface of the Schottky solar cell an interlayer of Al2O3 or SiO2. For the purpose of IV characterization of the manufactured Schottky solar cell a measuring apparatus was assembled.
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Optical response of asymmetric plasmonic structures
Babocký, Jiří ; Kolařík, Vladimír (referee) ; Čechal, Jan (advisor)
This diploma thesis deals with study of resonance modes of plasmonic structures. First part provides an overview of theoretical models, which explain the resonanace modes in plasmonic structures. Next part describes technology of electron beam lithography. First section of experimental part deas with technological processes leading to an improvement of resulting structures made by electron beam lithography that is followed by lift-off process. Last part focuses on a study of reflectance spactra of plasmonic antenas and the identification of resonance modes.
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Creation of plasmonic micro- and nanostructures by electron beam lithography
Babocký, Jiří ; Dvořák, Petr (referee) ; Kvapil, Michal (advisor)
This beachelor’s thesis deals with a fabrication of plasmonic antennas using electron beam lithography. First section consists of summary of a technologies that can be used for production of metallic micro and nanostructures on silicon and glass substrate. Second section provides a description of electron beam lithography method and technologies that are used for it. Final part describes experiments, that were done and empiric model describing dependance of dimension of fabricated structures on lithographic parameters.
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