|
|
Phyllotactic Model Linking Nano and Macro World
Horáček, Miroslav ; Meluzín, Petr ; Krátký, Stanislav ; Urbánek, Michal ; Bok, Jan ; Kolařík, Vladimír
Recently, the arrangement of diffraction primitives according to a phyllotactic model was presented. This arrangement was used to benchmarking purposes of the e-beam writer nano patterning. The phyllotactic arrangement has several interesting properties. One of them is related with the coherence between the nanoor microscopic domain of individual optical primitives and the properties of visually perceived images crated by these structures in the macro domain. This paper presents theoretical analysis of the phyllotactic arrangement in the referred context. Different approaches enabling the creation of diffractive optically variable images are proposed. The practical part of the presented work deals with the nano patterning of such structures using two different types of the e-beam pattern generators. One of them is a system with a variable shaped beam of electrons, while the other one is a system with a Gaussian-shaped beam. E-beam writing strategies and the use of inherent spiral patterns for exposure ordering and partitioning are also discussed.
|
|
|
SMV-2016-03: Precise relief structures
Matějka, Milan ; Horáček, Miroslav ; Meluzín, Petr ; Chlumská, Jana ; Král, Stanislav ; Kolařík, Vladimír ; Krátký, Stanislav ; Fořt, Tomáš ; Oulehla, Jindřich ; Šerý, Mojmír
Research and development in the field of precise relief structures using electron beam lithography and other ultra-precise micro manufacturing techniques.
|
|
| |
|
| |
|
|
Laser and Phyllotaxy
Kolařík, Vladimír ; Horáček, Miroslav ; Krátký, Stanislav ; Meluzín, Petr ; Chlumská, Jana ; Matějka, Milan ; Král, Stanislav
The paper presents planar diffractive structures with optical elements arranged in positions according to a phyllotactic model. Further, we discuss the creation of a diffractive phyllotactic pattern and its properties. One of the particular arrangements, a nesting of two different phyllotactic models possessing a different level of fineness, is described in details. The discussed arrangement of elements within a circle can be used also in the laser beam splitting application.
|
|
|
Vývoj aplikace na přípravu dat pro elektronový litograf
Meluzín, Petr
The development of application software for e-beam writter data preparation. Master thesis. Brno, 2016. The master thesis deals with the e-beam writter data preparation. The first part deals with electron beam lithography, posibilities and problems of data preparation and difractive optical elements. Afterwards the thesis describes development environment which was used for the development of application software itself. In the next part, the thesis deals with the appropriate design of application software, and its user-friendly interface. The output of the thesis is the implementation of the application software.
|
|
| |
|
| |
|
|
SMV-2015-15: Development of combined amplitude/phase photo masks
Horáček, Miroslav ; Kolařík, Vladimír ; Matějka, Milan ; Krátký, Stanislav ; Chlumská, Jana ; Meluzín, Petr ; Král, Stanislav
Research and development in the field of physical realization of transparent and opaque optical structures by means of electron beam lithography in a recording material supported by a glass substrate. The research covers the analysis of the graphical motive, its topology and morphology, research and application of binary and relief structures performing required graphical and optical properties, development of technology for the preparation of combined photo masks that process both the amplitude and the phase of the light beam, verification of optical properties of such masks.
|
|
|
SMV-2015-14: Development of e-beam lithography technology
Horáček, Miroslav ; Kolařík, Vladimír ; Matějka, Milan ; Krátký, Stanislav ; Chlumská, Jana ; Meluzín, Petr ; Král, Stanislav
Development of the devices for electron beam lithography technology. Research and development cover the complete lithography system, in particular Schottky Zro/W electron emitter, electron optical column including beam forming system, X-Y stage, high vacuum system, control system electronics.
|
guest ::
