Original title: Preparation of ppHMDSO Thin Films in Capacitively Coupled RF Glow Discharges under Dusty Plasma Conditions
Authors: Homola, V. ; Buršíková, V. ; Kelar, L. ; Kelarová, Š. ; Stupavska, M. ; Peřina, Vratislav
Document type: Papers
Conference/Event: 9th International Conference on Nanomaterials - Research and Application (NANOCON 2017), Brno (CZ), 20171018
Year: 2018
Language: eng
Abstract: The deposition of organosilicone thin films from mixture of hexamethyldisiloxane (HMDSO) and oxygen by using capacitively coupled R.F. glow discharges under dusty plasma conditions was investigated. High resolution topography and mechanical property maps of the prepared films were acquired by using atomic force microscopy techniques. The chemical bond and composition of the deposited films were analyzed by Fourier transform infrared spectroscopy (FTIR) and X-ray photoelectron spectroscopy (XPS). The mechanical properties of the films were studied using quasistatic as well as dynamic nanoindentation tests and their surface free energies were evaluated by means of contact angle measuring technique using several testing liquids exhibiting various surface tensions. The thermal stability of the films was studied using thermal desorption spectroscopy. Neural network modelling was used to study the effect of plasma parameters on the hardness of ppHMDSO films
Keywords: Hexamethyldisiloxane; mechanical properties; oxygen; PECVD
Project no.: LM2015056 (CEP)
Funding provider: GA MŠk
Host item entry: NANOCON 2017: Conference Proceedings, ISBN 978-80-87294-81-9

Institution: Nuclear Physics Institute AS ČR (web)
Document availability information: Fulltext is available at the institute of the Academy of Sciences.
Original record: http://hdl.handle.net/11104/0288520

Permalink: http://www.nusl.cz/ntk/nusl-387685


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Research > Institutes ASCR > Nuclear Physics Institute
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