Original title: Reactive Magnetron Sputtering of the Aluminium Oxide Coating
Authors: Dušek, Jan
Document type: Papers
Language: cze
Publisher: Vysoké učení technické v Brně, Fakulta elektrotechniky a komunikačních technologií
Abstract: This contribution deals with design, check and test of deposition parameters for new installed aluminium target. In addition of individual parts of deposition process and hysteresis of sputtering thin films of Al2O3 was verified. This made it possible to determine borders of reactive and metallic mode. The designed borders were created technological window for sputtering Al2O3 films. The sputtered thin films are tested on mechanical, optical properties and adhesion.
Keywords: aluminium oxide coating; pulse sputtering; Reactive magnetron sputtering
Host item entry: Proceedings of the 22nd Conference STUDENT EEICT 2016, ISBN 978-80-214-5350-0

Institution: Brno University of Technology (web)
Document availability information: Fulltext is available in the Brno University of Technology Digital Library.
Original record: http://hdl.handle.net/11012/83926

Permalink: http://www.nusl.cz/ntk/nusl-383644


The record appears in these collections:
Universities and colleges > Public universities > Brno University of Technology
Conference materials > Papers