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Sputtering of thin conductive layers
Sloboda, Alexander ; Vaněk, Jiří (oponent) ; Zatloukal, Miroslav (vedoucí práce)
This bachelor’s thesis is focused on the issues of thin films, especially thin transparent conductive films, and their deposition on substrate surface. Methods of deposition, their pros and cons, construction of the NP12 sputtering device, fundamentals of a deposition of thin conductive films, using reactive magnetron sputtering, preparation of substrates before deposition and thermal processing of substrates after deposition are issues that are described in this thesis. Instruction manual for magnetron sputtering device NP12 was created. For the purpose of this thesis several samples were prepared by magnetron sputtering device NP12 with different process parameters. These experimentally created samples were evaluated with the help of XRD measurement, to determine the influence of annealing in a vacuum oven on a crystal lattice. Substrates were also analysed by scanning electron microscope to evaluate presence of chemical elements inside the thin films.
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Sputtering of thin conductive layers
Sloboda, Alexander ; Vaněk, Jiří (oponent) ; Zatloukal, Miroslav (vedoucí práce)
This bachelor’s thesis is focused on the issues of thin films, especially thin transparent conductive films, and their deposition on substrate surface. Methods of deposition, their pros and cons, construction of the NP12 sputtering device, fundamentals of a deposition of thin conductive films, using reactive magnetron sputtering, preparation of substrates before deposition and thermal processing of substrates after deposition are issues that are described in this thesis. Instruction manual for magnetron sputtering device NP12 was created. For the purpose of this thesis several samples were prepared by magnetron sputtering device NP12 with different process parameters. These experimentally created samples were evaluated with the help of XRD measurement, to determine the influence of annealing in a vacuum oven on a crystal lattice. Substrates were also analysed by scanning electron microscope to evaluate presence of chemical elements inside the thin films.
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Reactive Magnetron Sputtering of the Aluminium Oxide Coating
Dušek, Jan
This contribution deals with design, check and test of deposition parameters for new installed aluminium target. In addition of individual parts of deposition process and hysteresis of sputtering thin films of Al2O3 was verified. This made it possible to determine borders of reactive and metallic mode. The designed borders were created technological window for sputtering Al2O3 films. The sputtered thin films are tested on mechanical, optical properties and adhesion.
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Hydrogen plasma treatment of ZnO thin films
Chang, Yu-Ying ; Neykova, Neda ; Stuchlík, Jiří ; Purkrt, Adam ; Remeš, Zdeněk
ZnO is an attractive wide band gap semiconductor with large exciton binding energy, high refractive index, high biocompatibility and diversety of nanostructure shapes which makes it suitable for many applications in the optoelectronic devices, optical sensors, and biosensors. We study the effect of hydrogen plasma treatment of the nominally undoped ZnO thin film deposited by DC reactive magnetron sputtering of Zn target in the gas mixture of argon and oxygen plasma. The SEM images show that the crystal size increases with film thickness. We confirm, that the electrical conductivity significantly increases after hydrogen plasma treatment by 4 orders of magnitude. Moreover, the increase of the infrared optical absorption, related to free carrier concentration, was detected below the optical absorption edge by the photothermal deflection spectroscopy.\n
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Funkční tenké vrstvy pro aplikace využívající pokročilé oxidační procesy
ŠRAM, Vlastimil
Tato diplomová práce si klade za cíl optimalizaci procesu nanášení tenkých vrstev pro využití v pokročilých oxidačních procesech (AOP). V rámci práce byla nanesena řada TiOx vrstev. Pro tento proces byla užita fyzikální metoda naprašování PVD. Fotokatalytická aktivita deponovaných vrstev byla testována pomocí rozkladu organického barviva Acid Orange 7. Dále pak byla u vrstev analyzována morfologie povrchu (SEM) a tloušťka vrstev (profilometrie). Studium vytvořených vrstev bylo zaměřeno na souvislost mezi charakteristikou jednotlivých vrstev, depozičními parametry a fotokatalytickými vlastnostmi. Na základě těchto výsledků byly vrstvy aplikovány v systému využívající AOP pro rozklad organických chemických látek. První kapitoly diplomové práce jsou věnovány shrnutí dosavadních znalostí o fotokatalýze a jejich principech. Další kapitola je věnována teorii a metodám nanášení tenkých vrstev a shrnutí znalostí o nízkotlakých výbojích. V experimentální části jsou popsány jednotlivé komponenty aparatury. Dále se experimentální část zaměřuje na rozbor tvorby optimalizačního procesu nanášení tenkých vrstev na bázi oxidu titanu. Poslední kapitola práce obsahuje výsledky experimentů na základě kterých je navržen další postup výzkumu této problematiky.
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