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Adhesion characterization of thin plasma-polymer films
Pálesch, Erik ; Klapetek, Petr (referee) ; Čech, Vladimír (advisor)
The diploma thesis deals with characterization of adhesion of plasma polymer films deposited on silicon wafers. The samples included organosilicon thin films based on tetravinylsilane monomer prepared by plasma-enhanced chemical vapour deposition. Scratch test was used to characterize film adhesion employing nanoindentation measurements. Adhesion of plasma polymer films of different mechanical properties and film thickness was analyzed by normal and lateral forces, friction coefficient, and scratch images obtained by scanning probe microscope working in atomic force microscopy mode.
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Surface topography of plasma polymers deposited on flat and fibrous substrates examined by atomic force microscopy
Kurakin, Yuriy ; Pálesch, Erik (referee) ; Čech, Vladimír (advisor)
This bachelor thesis deals with the characterization of the morphology of thin films of plasma polymers, which were prepared from the monomer tetravinylsilane and deposited on planar silicon substrates and type E glass fibers. Plasma enhanced chemical vapor deposition (PE CVD) has been used as a method of thin films preparations. Characterization of the surface morphology was made by using atomic force microscopy (AFM), for which was prepared literature review at the theoretical part of this bachelor thesis. The collected data have been used for estimating dependence of surface topography in relation to the deposition conditions and the size of investigated area. Also have been suggested methods of the data interpretation for purposes of subsequent statistical analysis.
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Surface morphology of a-CSi:H films prepared from tetravinylsilane in low-temperature plasma
Křípalová, Kristýna ; Pálesch, Erik (referee) ; Čech, Vladimír (advisor)
This bachelor thesis is focused on the surface morphology of a-CSi:H films. Films were prepared by plasma-enhanced chemical vapor deposition (PECVD) on silicon wafers using plasma discharge. Tetravinylsilane (TVS) precursor was used for deposition. The set of samples deposited at different effective power (2-150 W) and a thickness of about 0.6 µm was characterized to investigate their surface properties. Atomic force microscopy was used for characterization of surface morphology. Obtained results were used for evaluation of surface roughness and assessment of the effect of the film growth dynamics on the surface topography.
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Surface topography of a-CSi:H films deposited by continuous wave PECVD
Blažková, Naďa ; Pálesch, Erik (referee) ; Čech, Vladimír (advisor)
The thesis describes surface topography of a-CSi:H films deposited by continuous wave plasma enhanced chemical vapor deposition (PECVD) based on tetravinylsilane monomer (TVS). Thin films are completely used in many fields of modern technologies and their physical and mechanical properties are affected by thin film preparation techniques. In this thesis the thin films were deposited by PECVD method on silicon wafers with the pure TVS monomer. Deposited samples were topographically described and analyzed using atomic force microscopy (AFM). The main characteristics which were described are RMS roughness, autocorrelation function and a size distribution of grains on the thin film surface. Analysis was realized with two sets of samples with different powers and thickness. The main results were statistically evaluated like a mixture of object on the surface prepared in different deposition conditions.
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Surface and Mechanical Properties of Thin Films
Pálesch, Erik ; Klapetek, Petr (referee) ; Skuhurov,, Andrey (referee) ; Čech, Vladimír (advisor)
The doctoral thesis deals with the study of morphology and mechanical properties of thin plasma polymer films based on tetravinylsilane monomer and its mixtures with oxygen and argon. Thin films were prepared by plasma-enhanced chemical vapour deposition on silicon and glass substrates. Atomic force microscopy was used for characterization of thin film surface and for depiction of composite interphase with functional interlayer. Mechanical properties of thin films, namely Young’s modulus and hardness, were studied by cyclic nanoindentation technique. Nanoindentation device was also used to carry out scratch test, which was helpful to describe adhesion of films to substrate. In this thesis the influence of deposition conditions on surface and mechanical properties of thin films prepared in continual and pulse wave on planar substrates is discussed. Also, the suitability of few atomic force microscopy techniques for depiction of composite interphase was reviewed.
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Surface morphology of a-CSi:H films prepared from tetravinylsilane in low-temperature plasma
Křípalová, Kristýna ; Pálesch, Erik (referee) ; Čech, Vladimír (advisor)
This bachelor thesis is focused on the surface morphology of a-CSi:H films. Films were prepared by plasma-enhanced chemical vapor deposition (PECVD) on silicon wafers using plasma discharge. Tetravinylsilane (TVS) precursor was used for deposition. The set of samples deposited at different effective power (2-150 W) and a thickness of about 0.6 µm was characterized to investigate their surface properties. Atomic force microscopy was used for characterization of surface morphology. Obtained results were used for evaluation of surface roughness and assessment of the effect of the film growth dynamics on the surface topography.
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Surface topography of a-CSi:H films deposited by continuous wave PECVD
Blažková, Naďa ; Pálesch, Erik (referee) ; Čech, Vladimír (advisor)
The thesis describes surface topography of a-CSi:H films deposited by continuous wave plasma enhanced chemical vapor deposition (PECVD) based on tetravinylsilane monomer (TVS). Thin films are completely used in many fields of modern technologies and their physical and mechanical properties are affected by thin film preparation techniques. In this thesis the thin films were deposited by PECVD method on silicon wafers with the pure TVS monomer. Deposited samples were topographically described and analyzed using atomic force microscopy (AFM). The main characteristics which were described are RMS roughness, autocorrelation function and a size distribution of grains on the thin film surface. Analysis was realized with two sets of samples with different powers and thickness. The main results were statistically evaluated like a mixture of object on the surface prepared in different deposition conditions.
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Surface topography of plasma polymers deposited on flat and fibrous substrates examined by atomic force microscopy
Kurakin, Yuriy ; Pálesch, Erik (referee) ; Čech, Vladimír (advisor)
This bachelor thesis deals with the characterization of the morphology of thin films of plasma polymers, which were prepared from the monomer tetravinylsilane and deposited on planar silicon substrates and type E glass fibers. Plasma enhanced chemical vapor deposition (PE CVD) has been used as a method of thin films preparations. Characterization of the surface morphology was made by using atomic force microscopy (AFM), for which was prepared literature review at the theoretical part of this bachelor thesis. The collected data have been used for estimating dependence of surface topography in relation to the deposition conditions and the size of investigated area. Also have been suggested methods of the data interpretation for purposes of subsequent statistical analysis.
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