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National Repository of Grey Literature 2 records found  Search took 0.00 seconds. 
Sputtering of nitride layers using Kaufman ion-beam source for bioelectronics applications
 Jarušek, Jaromír ; Chmela, Ondřej (referee) ; Gablech, Imrich (advisor)
In this work, nitride layers, their applications in bioelectronics, and methods of chemical vapour deposition and physical vapour deposition are presented. The focus of this work is the preparation of titanium nitride thin films by reactive sputtering using Kaufman ion-beam sources. Thin films were deposited on silicon wafers and microslides. Deposited titanium nitride thin films are characterized by X-ray diffraction, four-point probe sheet resistance measurement and profilometry to determine residual stress.
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Sputtering of nitride layers using Kaufman ion-beam source for bioelectronics applications
 Jarušek, Jaromír ; Chmela, Ondřej (referee) ; Gablech, Imrich (advisor)
In this work, nitride layers, their applications in bioelectronics, and methods of chemical vapour deposition and physical vapour deposition are presented. The focus of this work is the preparation of titanium nitride thin films by reactive sputtering using Kaufman ion-beam sources. Thin films were deposited on silicon wafers and microslides. Deposited titanium nitride thin films are characterized by X-ray diffraction, four-point probe sheet resistance measurement and profilometry to determine residual stress.
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