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Microstructure revealing and analysis of partially sintered oxide ceramic materials
Jemelka, Marek ; Salamon, David (referee) ; Spusta, Tomáš (advisor)
The goal of this bachelor’s thesis is to experimentally determine appropriate etching conditions for etching of partially sintered advanced ceramic materials (Al2O3, ZrO2 + 3mol % Y2O3, ZrO2 + 8mol % Y2O3) with emphasis on minimal influence on the final surface microstructure. The obtained results show, that the optimal etching way of selected materials is thermal etching under conditions: Al2O3 (rel. 95,7 ± 0,9 %)- Te = 1015 C (Ts – 350 C), tetragon. ZrO2 (rel. 94,5 ± 0,6 %)- Te = 1005 C (Ts – 350 C), cubic. ZrO2 (rel. 94 ± 0,5 %)- Te = 1105 C (Ts – 350 C). The applying of chemical etching in H3PO4 for 60s led to revealing of the microstructure of Al2O3 and cubic ZrO2 in shorter times, but the procedure carries its difficulties of etching conditions determination and execution itself, which put it in the second place. Microstructure revealing via using focused ion beam was experimentally determined as inappropriate due to time and personnel demands.
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Interaction of a SNOM tip with electromagnetic near-field produced by interference of surface plasmon polaritons
Jakub, Zdeněk ; Břínek, Lukáš (referee) ; Dvořák, Petr (advisor)
The aim of this bachelor’s thesis is fabrication of probes for scanning near-field optical microscope (SNOM) and testing of their functionality by measuring interference patterns of surface plasmon polaritons (SPP). The theoretical part deals with the basic properties of SPP’s and methods of their excitation and detection. In the experimental part, methods of sharp tip fabrication by chemical etching, thin film deposition by ion beam sputtering (IBS) or by ion beam assisted deposition (IBAD) and aperture opening by focused ion beam (FIB) are explained and demonstrated. Finally, interference patterns of SPP’s are measured with fabricated probes and the results are compared with the results obtained with commercially available probes.
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Delayering of semiconductor chips
Valachovič, Marek ; Adámek, Martin (referee) ; Búran, Martin (advisor)
This work describes the individual layers of whitch the semiconductor chip is composed, the types of packages in witch it can be encapsulated and the methods of connecting the chip with the package. Furthermore, the methods of dacapsulating the encapsulated chip and delayering using several different methods, such as mechanical, chemical, plasmatic, or using an focused ion beam, are describe here. The methods of mechanical and chemical delayering of the layers of the semiconductor chip togeaher with dalayering by focused ion beam with the help of gas are practically performed and recorded.
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Study of the interaction of nanocomposite films with plasma
Steinhartová, Tereza ; Hanuš, Jan (advisor) ; Kousal, Jaroslav (referee)
The theoretical part deals with basic characteristics of low-temperature, low-pressure plasma. It describes the principles of preparation of nanocomposite films using this type of plasma and also the etching process in chemically active plasma. It further explains the basic principles of methods used to characterize our samples. The experimental part describes the process of optimalization of chemically active plasma ($O_2/Ar$) employed for etching of plasma polymer films. After finding suitable etching parameters several types of films were prepared. First, films of plasma polymer and then nanocomposite films composed of metal and plasma polymer. Afterwards the samples were treated in defined conditions of oxygen plasma. The aim was to study the physico-chemical properties of these films, especially their chemical composition using X-ray photoelectron spectroscopy, and wettability. Attention was given to the change of the water contact angle as a function of etching time and morphology of the pample. In case of oxygen etching ageing of the film was studied. By increasing of roughness superhydrophobic (SHF) film was prepared.
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Study of the interaction of nanocomposite films with plasma
Steinhartová, Tereza ; Hanuš, Jan (advisor) ; Kousal, Jaroslav (referee)
The theoretical part deals with basic characteristics of low-temperature, low-pressure plasma. It describes the principles of preparation of nanocomposite films using this type of plasma and also the etching process in chemically active plasma. It further explains the basic principles of methods used to characterize our samples. The experimental part describes the process of optimalization of chemically active plasma ($O_2/Ar$) employed for etching of plasma polymer films. After finding suitable etching parameters several types of films were prepared. First, films of plasma polymer and then nanocomposite films composed of metal and plasma polymer. Afterwards the samples were treated in defined conditions of oxygen plasma. The aim was to study the physico-chemical properties of these films, especially their chemical composition using X-ray photoelectron spectroscopy, and wettability. Attention was given to the change of the water contact angle as a function of etching time and morphology of the pample. In case of oxygen etching ageing of the film was studied. By increasing of roughness superhydrophobic (SHF) film was prepared.
|
|
|
Microstructure revealing and analysis of partially sintered oxide ceramic materials
Jemelka, Marek ; Salamon, David (referee) ; Spusta, Tomáš (advisor)
The goal of this bachelor’s thesis is to experimentally determine appropriate etching conditions for etching of partially sintered advanced ceramic materials (Al2O3, ZrO2 + 3mol % Y2O3, ZrO2 + 8mol % Y2O3) with emphasis on minimal influence on the final surface microstructure. The obtained results show, that the optimal etching way of selected materials is thermal etching under conditions: Al2O3 (rel. 95,7 ± 0,9 %)- Te = 1015 C (Ts – 350 C), tetragon. ZrO2 (rel. 94,5 ± 0,6 %)- Te = 1005 C (Ts – 350 C), cubic. ZrO2 (rel. 94 ± 0,5 %)- Te = 1105 C (Ts – 350 C). The applying of chemical etching in H3PO4 for 60s led to revealing of the microstructure of Al2O3 and cubic ZrO2 in shorter times, but the procedure carries its difficulties of etching conditions determination and execution itself, which put it in the second place. Microstructure revealing via using focused ion beam was experimentally determined as inappropriate due to time and personnel demands.
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|
|
Interaction of a SNOM tip with electromagnetic near-field produced by interference of surface plasmon polaritons
Jakub, Zdeněk ; Břínek, Lukáš (referee) ; Dvořák, Petr (advisor)
The aim of this bachelor’s thesis is fabrication of probes for scanning near-field optical microscope (SNOM) and testing of their functionality by measuring interference patterns of surface plasmon polaritons (SPP). The theoretical part deals with the basic properties of SPP’s and methods of their excitation and detection. In the experimental part, methods of sharp tip fabrication by chemical etching, thin film deposition by ion beam sputtering (IBS) or by ion beam assisted deposition (IBAD) and aperture opening by focused ion beam (FIB) are explained and demonstrated. Finally, interference patterns of SPP’s are measured with fabricated probes and the results are compared with the results obtained with commercially available probes.
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