National Repository of Grey Literature 20 records found  previous11 - 20  jump to record: Search took 0.01 seconds. 
Hydrogen plasma treatment of ZnO thin films
Chang, Yu-Ying ; Neykova, Neda ; Stuchlík, Jiří ; Purkrt, Adam ; Remeš, Zdeněk
ZnO is an attractive wide band gap semiconductor with large exciton binding energy, high refractive index, high biocompatibility and diversety of nanostructure shapes which makes it suitable for many applications in the optoelectronic devices, optical sensors, and biosensors. We study the effect of hydrogen plasma treatment of the nominally undoped ZnO thin film deposited by DC reactive magnetron sputtering of Zn target in the gas mixture of argon and oxygen plasma. The SEM images show that the crystal size increases with film thickness. We confirm, that the electrical conductivity significantly increases after hydrogen plasma treatment by 4 orders of magnitude. Moreover, the increase of the infrared optical absorption, related to free carrier concentration, was detected below the optical absorption edge by the photothermal deflection spectroscopy.\n
The intrinsic submicron ZnO thin films prepared by reactive magnetron sputtering
Remeš, Zdeněk ; Stuchlík, Jiří ; Purkrt, Adam ; Chang, Yu-Ying ; Jirásek, Vít ; Štenclová, Pavla ; Prajzler, V. ; Nekvindová, P.
The DC reactive magnetron sputtering of metallic target in oxide atmosphere is a simple method of depositing the intrinsic (undoped) nanocrystalline layers of metal oxides. We have optimized the deposition of the intrinsic ZnO thin films with submicron thickness 50-500 nm on fused silica glass substrates and investigated the localized defect states below the optical absorption edge down to 0.01 % using photothermal deflection spectroscopy from UV to IR. We have shown that the defect density, the optical absorptance and the related optical attenuation in planar waveguides can be significantly reduced by annealing in air at 400 °C.
Transfer of electrons or holes between localized states. Application to polymer electric conductivity
Král, Karel ; Menšík, Miroslav
Basing on the quantum transport formalizm a formula for the irreversible transfer of charged particles has been introduced by us recently. This formula is expected to be suitable for the theoretical description of the electron or hole transfer between quantum dots, other nanoparticles, molecules, and so on. We discuss shortly the main physical properties of the formula. We also demonstrate the use of the formula for the theoretical analysis of the electronic physical properties of some electrically conductive polymers.\n
Photocatalytic active coatings-environmental way to improve quality and durability of buildings
Sázavská, T. ; Jakubičková, M. ; Jirkovský, Jaromír ; Šubrt, Jan ; Peterka, F.
Transparent coatings of TiO2-SiO2 nanocomposite were developed to be applied on building facades in order to prevent growth of microorganisms and thus to improve urban building sustainability. Structure and texture characteristics of the prepared nanocomposites were determined by electron microscopy (SEM, TEM + EDS), their photocatalytic activity was quantified by testing self-cleaning ability and antimicrobial activity. The self-cleaning properties were evaluated according to the standard ISO method based on photocatalytic degradation of methylene blue. The TiO2-SiO2 nanocomposite coatings were applied on various types of substrates commonly used in building industry. The antimicrobial activity was mainly investigated for algae because these microorganisms are often responsible for facades ageing. According to the laboratory tests the prepared TiO2-SiO2 nanocomposites are highly efficient. This fact was already proved by first applications in real conditions. The transparent SiO2-TiO2 nanocomposites represent an ecological and noninvasive way how to keep nice appearance of buildings for a long time. It is due to their permanent photocatalytic activity causing self-cleaning and algicidal effects. Such coatings may significantly reduce ageing processes on facades of buildings that are caused by microbiological pollution and smog exhalations.
Blaze Gratings with a Ribbed Back Slope
Krátký, Stanislav ; Meluzín, Petr ; Horáček, Miroslav ; Kolařík, Vladimír ; Matějka, Milan ; Chlumská, Jana ; Král, Stanislav
Binary relief phase-modulated gratings provide symmetrical diffraction of the incoming light beam. Asymmetrical gratings, e.g. asymmetrical triangular blazed gratings, are characteristic by an asymmetrical diffraction behavior, where one of the first diffraction orders is more important than the other one. Electron beam lithography is a suitable and flexible tool for patterning of such kind of gratings. High quality results can be readily obtained when the period of the grating is relatively large and the relief depth is relatively low, this is the case of gratings with a small blaze angle. As the blaze angle increases, the quality of result suffers from several patterning-related issues. One of the problems is a reflection of the incoming light beam from the back slope (anti-blaze facet) of the blaze grating. We propose a novel configuration, with a ribbed modulation of the back slope. This modulation is perpendicular to the direction of the grating grooves. This paper presents an analysis of the proposed blazed grating configuration. E-beam pattern generators were used to prepare a few\nsamples of blaze gratings with a ribbed back slope. One part of the experiment was performed with a Gaussianshaped beam and another one with the variable-shaped beam. Results of the experiment are presented.\nFinally, we discuss the optical performance of two blaze gratings with similar parameters, one of them is with the flat back slope and another one is with the ribbed back slope.
Parameter Optimization of Multi-Level Diffraction Gratings
Matějka, Milan ; Kolařík, Vladimír ; Horáček, Miroslav ; Král, Stanislav
Originally, the e-beam lithography (EBL) is a technique for creating high-resolution black and white masks for the optical lithography. Multi-level relief structures can be also prepared using EBL patterning. Their preparation is based on the image patterning with a gradient of exposure doses. Large-area multi-level structures can be effectively prepared using the electron beam pattern generator with a variable shaped beam. We present several writing strategies. Basically, the main writing strategy uses one stamp (i.e. one elementary exposure of the shaped electron beam) per one elementary area with the same exposure dose. This simple approach is fast and flexible, however it does not guarantee optimal results. The main problem is an imperfection of the stamps (size, shape, and homogeneity). Advanced algorithms are based on multiple\nexposure of the same elementary area, the total local exposure dose is a sum of several different elementary exposures (stamps). Using these algorithms, a smoother surface of the structure can be achieved. On the other hand, the writing speed is considerably decreased. Tradeoff between the achieved parameters and the writing speed is discussed for selected set of writing strategy algorithms.
Nanopatterning of Silicon Nitride Membranes
Matějka, Milan ; Krátký, Stanislav ; Řiháček, Tomáš ; Kolařík, Vladimír ; Chlumská, Jana ; Urbánek, Michal
Membranes are typically created by a thin silicon nitride (SIN) layer deposited on a silicon wafer. Both, top and bottom side of the wafer is covered by a thin layer of the silicon nitride. The principle of silicon nitride membranes preparation is based on the wet anisotropic etching of the bottom side of the silicon wafer with crystallographic orientation (100). While the basic procedure for the preparation of such membranes is well known, the nano patterning of thin membranes presents quite important challenges. This is partially due to the mechanical stress which is typically presented within such membranes. The resolution requirements of the membrane patterning have gradually increased. Advanced lithographic techniques and etching procedures had to be developed. This paper summarizes theoretical aspects, technological issues and achieved results. The application potential of silicon nitride membranes as a base for multifunctional micro system (MMS) is also\ndiscussed.
Structural Colors of Self-Similar Nano Patterns
Meluzín, Petr ; Horáček, Miroslav ; Krátký, Stanislav ; Kolařík, Vladimír
E-beam lithography is a flexible technology for various diffraction gratings origination. The e-beam patterning typically allows for the creation of optical diffraction gratings in the first diffraction order. However, the very high resolution enables also the patterning of structures providing the zero-order diffraction. Recently, we presented a work on the structural colors of metallic layers covering both regular-line structures and CGH (computer generated hologram) structures. This work presents a study dealing with zero-order diffraction structures with self-similar properties. The practical part of the work is focused on two aspects: design parameters and technological issues. Variations in design parameters include the tone of the structure (positive or negative),\nthe density of filling, the filling factor, and the depth of the structures. The achieved gamut of colors may by primarily extended by the proper selection of metal deposition technology and its parameters, and further by the proper selection of the metal and the thickness of its layer, these are the technological issues.
Phyllotactic Model Linking Nano and Macro World
Horáček, Miroslav ; Meluzín, Petr ; Krátký, Stanislav ; Urbánek, Michal ; Bok, Jan ; Kolařík, Vladimír
Recently, the arrangement of diffraction primitives according to a phyllotactic model was presented. This arrangement was used to benchmarking purposes of the e-beam writer nano patterning. The phyllotactic arrangement has several interesting properties. One of them is related with the coherence between the nanoor microscopic domain of individual optical primitives and the properties of visually perceived images crated by these structures in the macro domain. This paper presents theoretical analysis of the phyllotactic arrangement in the referred context. Different approaches enabling the creation of diffractive optically variable images are proposed. The practical part of the presented work deals with the nano patterning of such structures using two different types of the e-beam pattern generators. One of them is a system with a variable shaped beam of electrons, while the other one is a system with a Gaussian-shaped beam. E-beam writing strategies and the use of inherent spiral patterns for exposure ordering and partitioning are also discussed.
The role of sonication of PEO solutions with magnetic nanoparticles on morphology of the resulting nanofibrous mats
Peer, Petra ; Stěnička, M. ; Filip, Petr ; Pizúrová, Naděžda ; Babayan, V.
Properties of the resulting polymer nanofibres are often tailored by sonication technique applied prior or past an electrospinning process. The aim of this contribution is to evaluate morphology of nanofibrous mats formed by poly(ethylene oxide) with distributed magnetic nanoparticles (about 20nm in diameter) in dependence on time of sonication of the used polymer solutions. The solutions were exposed to sonication (intensity 200W, frequency 24 kHz) for 10, 30, and 60 minutes. It was shown that rheological characteristics (viscosity, storage and loss moduli) strongly depend on time of sonication (particularly phase angle) in contrast to electric conductivity and surface tension. For analysis of homogeneous distribution of magnetic field and magnetorheological efficiency (a relation of corresponding ciscosities) was process of electrospinning and resulting wuality of the obtained nanofibrous mats.

National Repository of Grey Literature : 20 records found   previous11 - 20  jump to record:
Interested in being notified about new results for this query?
Subscribe to the RSS feed.