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Adhesion of a-SiOC:H films on planar substrates
Lepcio, Petr ; Salyk, Ota (referee) ; Čech, Vladimír (advisor)
This bachelor thesis deals with preparation of thin films of plasma polymers prepared by plasma-enhanced chemical vapor deposition. Tetravinylsilane was used as a monomer. Two sets of samples were prepared. Samples of the first set were prepared at different effective powers from pure tetravinylsilane and samples of the second set were prepared from deposition mixture of tetravinylsilane with different oxygen content at constant effective power. The film thickness was evaluated by spectroscopic ellipsometry and chemical structure by infrared spectroscopy. A scratch test was used to determine adhesion characterized by the critical normal load. An appearance of performed scratches was obtained by atomic force microscopy (AFM). Film adhesion influenced by the effective power and oxygen content in deposition mixture was discussed based on the received data.
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Analysis of a-SiOC:H films by selected spectroscopic techniques
Ondreáš, František ; Zmeškal, Oldřich (referee) ; Čech, Vladimír (advisor)
This bachelor thesis deals with preparation of thin plasma polymer films on the basis of tetravinylsilane by plasma-enhanced chemical vapour deposition and film characterization by selected spectroscopic techniques. The theoretical part is a background research about plasma chemistry and spectroscopic methods of characterisation of thin plasma polymer films. The practical part consisted of preparation of two series of samples and their characterization. Prepared thin plasma polymer films were characterized by selected spectroscopic techniques. Thickness and optical constants were determined by spectroscopic elipsometry. Chemical structure was characterized by infrared spectroscopy. The results indicate the possibility of managing physico-chemical properties of thin plasma polymer films on the basis of tetravinylsilane by deposition conditions and thus possibility of preparation materials tailored to a variety of applications.
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SiOx based barrier coatings
Sedláček, Ondřej ; Dzik, Petr (referee) ; Přikryl, Radek (advisor)
The theme of this thesis is based on the preparation and characterization thin films prepared by methods like a Physical Vapor Deposition, Plasma Assisted Vapor Deposition and Plasma Enhanced Chemical Vapor Deposition. The elementary materials for the preparation of these layers are silicon monooxide powder, melamine and hexamethyldisiloxane. These layers have been prepared with regards to their usage like a barrier coatings with emphasis on poisonous organic substances resistance.. We made a characterization of these films. This characterization is consist of researching of their physical properties (the ability to resist permeation of certain organic compounds), and their chemical composition too. We used to some specific method for these characteristics, for example: FTIR, OTR, ellipsometry, SEM and measuring of the permeation of selected industrial pollutants resistance.
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Depozice a zpracování uhlíkových nanotrubek připravených metodou PECVD za atmosférického tlaku
Kučerová, Z. ; Zajíčková, L. ; Jašek, O. ; Eliáš, M. ; Synek, P. ; Matějková, Jiřina ; Rek, Antonín ; Buršík, Jiří
Carbon nanotubes (CNTs) were synthesized by plasma enhanced chemical vapor deposition from mixture of argon, methane and hydrogen using microwave plasma torch at atmospheric pressure. Nanotubes grew on a complex substrate system consisting of silicon wafer, buffer layer and thin catalytic iron film. As confirmed by scanning electron microscopy (SEM), this deposition technique produces bundles or ropes of nanotubes covered by crust composed of catalytic particles, amorphous carbon and other impurities such as fullerenes or other carbon nanoparticles. Because many scientific and technological applications, as well as characterization techniques require individual nanotubes a great attention has to be paid to the post-deposition processing of the deposit. The nanotube bundle could be separated by ultrasonication of the deposit in organic or inorganic liquid. Most commonly used liquids are water or ethanol.
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Nanocrystalline diamond films deposition by PECVD in ASTEX type microwave reactor
Jašek, O. ; Karásková, M. ; Buršíková, V. ; Zajíčková, L. ; Franta, D. ; Frgala, Z. ; Matějková, Jiřina ; Rek, Antonín ; Klapetek, P. ; Buršík, Jiří
Nanocrystalline diamond film was deposited by microwave CVD in the ASTeX type reactor on a mirror polished (111) oriented n-doped silicon substrate. The deposition mixture consisted of 9 pct of methane in hydrogen. The applied microwave power (2.45 GHz)and pressure were 850 W and 7.5 kPa, respectively. The substrate temperature was 1 090 K. The diamond nucleation process was enhanced by rf induced dc selfbias of -125 V. The film exhibited very low roughness (rms of heights 9.1 nm). Its hardness and elastic modules were 70 and 375 GPa, respectively. The optical constants were determined by combination of spectroscopic ellipsometry and reflectometry employing the Rayleigh-Rice theory for the roughness and the dispersion model of optical constants based on the parameterization of densities of states. The deposition rate was 57 nm/min including the 5 min nucleation step.
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