|
| |
|
|
Fabrication of graphene mid-infrared biosensor
Gallina, Pavel ; Hrabovsk, Milo (referee) ; Sadlek, Jakub (advisor)
The main subject of this bachelor's thesis was fabrication and measurement of response of graphene plasmonic biosensor prepared on flat and curved surfaces. Graphene produced by chemical vapour deposition (CVD) method was used for preparation of these sensors. The structures were fabricated using electron beam (EBL) and optical lithography, reactive ion etching (RIE) and magnetron sputtering. The resultant sensors were then observed in electron (SEM) and optical microscope, the topography was surveyed in atomic force microscope (AFM) and the measurement was carried out by Fourier transform infrared spectoscopy (FTIR).
|
|
|
Characterization of Nanostructures Deposited by High-Frequency Magnetron sputtering
Hégr, Ondřej ; Boušek, Jaroslav (advisor)
This thesis deals with the analysis of nano-structured layers deposited by high-frequency magnetron sputtering on the monocrystalline silicon surface. The content of the work focuses on the magnetron sputtering application as an alternative method for passivation and antireflection layers deposition of silicon solar cells. The procedure of pre-deposite silicon surface cleaning by plasma etching in the Ar/H2 gas mixture atmosphere is suggested. In the next step the silicon nitride and aluminum nitride layers with hydrogen content in Ar/N2/H2 gas mixture by magnetron sputtering are deposited. One part of the thesis describes an experimental pseudo-carbide films deposition from a silicon target in the atmosphere of acetylene (C2H2). An emphasis is placed on the research of sputtered layers properties and on the conditions on the silicon-layer interface with the help of the standard as well as special measurement methods. Sputtered layers structure is analyzed by modern X-ray spectroscopy (XPS) and by Fourier infrared spectroscopy (FTIR). Optical ellipsometry and spectrophotometry is used for the diagnostic of the layers optical properties depending upon the wavelength of incident light. A special method of determining the surface lay-out of the charge´s carrier life in the volume and on the surface of silicon is employed to investigate the passivating effects of the sputtered layers.
|
|
|
Thermal stability of sputtered yttrium oxide layers
Kršňák, Jiří ; Boušek, Jaroslav (referee) ; Hégr, Ondřej (advisor)
This work deals with behavior of deposited yttrium oxide thin film after heat stress. Within solution thin yttrium oxide films were deposited at silicon substrates, which were exposed to various cycles of heat stress. Tested structures were investigated before and after heat stress in term of surface topography stability with the hepl of electron microscopy.
|
|
|
Optimization of thin films of metal oxide materials
Vítek, Jiří ; Šimonová, Lucie (referee) ; Šubarda, Jiří (advisor)
This thesis is focused on the description of the method of reactive sputtering of thin films. Currently, there are many ways how to create thin films and there are many applications of thin films in various industrial sectors. In this paper at the first are listed the issue of thin films, followed by an overview of the deposition techniques and of the chemical analysis of deposited thin films. It also describes the four-point measurement method of sheet resistance, mechanical test of adhesion and optical properties. At the end of the theoretical part are described the material composition of the deposited films. The goal of the practical part is to optimize the deposition process of the mixed layer of indium tin oxide (In2O3: SnO2) and contribute to the overall understanding of the influence of annealing on the layer. There were created six series of samples with that applied layers. First, the work focused on examining of the influence of annealing on the throughput in the whole measuring range, and then comparing the series due to the transmittance in the visible light spectrum. Furthermore were compared the value of sheet resistance of unannealed and subsequently annealed samples.
|
|
|
Creating themes thin-film methods
Ondráček, Michal ; Šimonová, Lucie (referee) ; Šubarda, Jiří (advisor)
The master’s thesis deals with the theory of thin film technology, especially creating these layers. The work includes the distribution of vacuum deposition techniques for physical (PVD) and chemical (CVD). The main aim is to create a theme in different ways of implementation by using magnetron sputtering device, and these motives evaluated in terms of the quality of sputtering.
|
|
| |
|
|
Deposition of the thin films for applications of advanced oxidation processes using metal dopants
KRAJČOVIČ, Jan
The aim of this diploma thesis is deposition of TiO2 thin films onto different types and sizes of substrates, and some of these layers dope by iron or silver. During the work was range of TiO2 layers created using a method of physical vapor deposition namely magnetron sputtering. For these processes was chosen the Dreva ARC 400 Hard Material Coating Plant device. The main aim of these depositions was to attempt to create TiO2 thin films on a substrates of larger surface than its in average laboratory processes usual. For this purpose were TiO2 layers deposited onto square glass plates of side length 10 cm. For comparsion and analysis were also as a substrates used microscope slides and fragments of silicon wafers. These substrates were used for testing of photocatalytic activity and on surface morphology (SEM). The theoretical part of this thesis aims to a methods of deposition TiO2 layers and their characteristics. In the experimental part is the used coating equipment and parameters of each deposition process described. Further the characteristics and results of individual experiments are described.
|
|
| |
|
| |
guest ::
