National Repository of Grey Literature 29 records found  beginprevious20 - 29  jump to record: Search took 0.02 seconds. 
Monitoring of the plasmachemical process using mass spectrometry
Ondra, Zdeněk ; Čáslavský, Josef (referee) ; Čech, Vladimír (advisor)
This bachelor thesis deals with plasma-enhanced chemical vapor deposition (PECVD) and the use of mass spectrometry to monitor the processes in plasma during the deposition of thin film. Tetravinylsilane plasma was used in the process of forming a thin film on the silicon wafer. The background of the spectrometer, the residual gases in the plasma reactor at basic pressure were characterized and the plasma polymerization process was monitored. This process was monitored with increasing effective power (2-150 W). The obtained mass spectra were assigned and described in detail. The plasma species that showed the greatest change were then characterized as a function of time during film deposition.
Plasma surface modification of glass fibers and its optimization
Širjovová, Veronika ; Knob, Antonín (referee) ; Čech, Vladimír (advisor)
Diploma thesis deals with glass fiber surface modification using plasma-enhanced chemical vapor deposition in order to prepare functional interface that enhances the properties of polymer composites. The effect of deposition conditions on shear strength was observed with respect to the chemical composition of the deposited film. Thin films were deposited on planar substrates and fibers using monomer tetravinylsilane in a mixture with oxygen at selected power of plasma discharge. Chemical composition of prepared material was analyzed by infrared spectroscopy. Planar substrate film adhesion was measured using the scratch test. The composite sample was prepared by embedding the surface modified fibers in unsaturated polyester resin, followed by the curing process. The cured composite sample underwent the short beam shear test.
Polymer composites with controlled interphase
Zvonek, Milan ; Knob, Antonín (referee) ; Čech, Vladimír (advisor)
Cieľom diplomovej práce je príprava polymerných kompozitov vyztužených sklenenými vláknami s riadenou medzifázou za použitia metódy plazmochemickej depozície z plynnej fáze a monomeru tetravinylsilanu. Teoretická časť je zameraná na literárnu rešerš o plazme, plazmovej polymerácií, tenkých vrstvách a kompozitoch. Experimentálna časť popisuje použité materiály a aparaturu použitú na povrchovú modifikáciu sklenených vlákien a prípravu vláknom vyztužených kompozitov. Povrchová úprava sklenených vlákien prebiehala za rôznych depozičných podmienok. Chemické a mechanické analýzy vytvorenej medzivrstvy prebiehali za použitia FTIR spektrometrie a vrypového testu. Vliv povrchovej úpravy bol zistený pomocou získanej interlaminárnej šmykovej sily použítím testu krátkych trámečkov.
Nanolayered Composites
Kontárová, Soňa ; Salyk, Ota (referee) ; Mistrík, Jan (referee) ; Čech, Vladimír (advisor)
Tato studie je zaměřena na základní výzkum tenkých vrstev plazmových polymerů a vliv depozičních podmínek na strukturu a vlastnosti jednotlivých vrstev a multivrstev připravených pomocí metody PE CVD. Jednotlivé vrstvy a multivrstvy a-SiC:H byly deponovány na křemíkové substráty z monomeru tetravinylsilanu (TVS) při různých výkonech v kontinuálním a pulzním režimu. Vrstvy byly rozsáhle zkoumány pomocí spektroskopické elipsometrie, nanoindentace, mikroskopie atomárních sil (AFM), rentgenové fotoelektronové spektroskopie (XPS), spektroskopie Rutherfordova zpětného rozptylu (RBS), rentgenové reflektivity, Fourierovy transformační infračervené spektroskopie (FTIR) a měření kontaktního úhlu, pro zjištění jejich optických, mechanických a chemických vlastností. Byl zkoumán a prokázán vliv depozičních podmínek na fyzikálně-chemické vlastnosti pp-TVS vrstev. Jednotlivé vrstvy byly v rámci po-depoziční úpravy vystaveny UV záření a byl zkoumán účinek stárnutí a vliv UV záření na jejich fyzikální a chemické vlastnosti. Multivrstevnaté struktury (plazmaticky polymerizované 2-vrstvy a 10-ti-vrstvy) s tloušťkou jednotlivých vrstev od 0,5 µm do 25 nm byly úspěšně deponovány a charakterizovány pomocí elipsometrické spektroskopie. Na základě získaných poznatků je možné připravit materiály s vlastnostmi upravenými podle požadavků pro využití v nanokompozitních aplikacích a optických zařízeních.
Deposition and optical properties of thin films and layered structures by PECVD
Kucharčík, Jan ; Boušek, Jaroslav (referee) ; Čech, Vladimír (advisor)
Thesis in theoretical part is focused on the principle of spectroscopic ellipsometry and formation of thin films by plasma-enhanced chemical vapor deposition (PECVD). In the experimental part we describe the deposition system, ellipsometer and mathematical evaluation of ellipsometric data, materials used for film formation and processing of the samples. Single-layer and multilayer structures of polymeric materials were prepared. We revealed that the optical properties of thin films are independent of film thickness. We also described the effect of the effective power and deposition gas mixture on optical properties of thin films.
Plasmachemical processing of fibrous reinforcements for polymer composites
Knob, Antonín ; Lapčík, Ĺubomír (referee) ; Čech, Vladimír (advisor)
The diploma thesis is aimed at coating of glass fibers using tetravinylsilane as a monomer by Plasma-Enhanced Chemical Vapor Deposition (PECVD). The surface modified fibers were used as reinforcements for unsaturated polyester resin to form composites of controlled interphase. Chemical and mechanical properties of thin films were controled by the effective power. Determination of fiber-matrix adhesion and an influence of polymer-interface on mechanical properties of composites were characterized by Scanning Electron Microscopy (SEM) and microindentation technique using Interfacial Testing System (ITS) enabling to measure the interfacial shear strength.
Formation of layered structures using PE CVD technique
Hoferek, Lukáš ; Krčma, František (referee) ; Čech, Vladimír (advisor)
The work is aimed at preparation and characterization of thin films deposited by Plasma-Enhanced Chemical Vapor Deposition (PE-CVD) on silicon wafers. A comprehensive characterization of the deposition system in order to determine the range of deposition conditions was a part of the study. Subsequently, the single and multi-layers were deposited from tetravinylsilane monomer. The deposition process was monitored by spectroscopic ellipsometry and mass spectroscopy. Layers and layered structures were characterized by microscopic and spectroscopic techniques. The physical and chemical properties of deposited films were studied with respect to the deposition conditions and monomer fragmentation in low-temperature plasma.
Study of plasma species by mass spectroscopy
Bureš, Michal ; Čáslavský, Josef (referee) ; Čech, Vladimír (advisor)
Plasma polymer films of tetravinylsilane and mixture of tetravinylsilane and oxygen gas were deposited on silicon wafers. Oxygen gas was mixed in tetravinylsilane to improve the compatibility of thin films on glass substrates. Mass spectroscopy was employed during the cleaning of the deposition chamber to check residual gases and process gases, during plasma deposition to monitor neutral plasma species and to follow plasma stability.
Plasma surface modification of glass fibers on a basis of organosilicones
Veteška, Jaromír ; Salyk, Ota (referee) ; Čech, Vladimír (advisor)
This thesis is aimed at preparation of thin plasma-polymerized films deposited on glass fibers by Plasma-Enhanced Chemical Vapor Deposition (PE CVD) from a mixture of tetravinylsilane (TVS) and oxygen gas. Plasma-polymerized films which were deposited on silicon wafers were used to characterize chemical properties and optimization of deposition process with respect to reproducibility.
Adhesion of a-SiOC:H films on planar substrates
Lepcio, Petr ; Salyk, Ota (referee) ; Čech, Vladimír (advisor)
This bachelor thesis deals with preparation of thin films of plasma polymers prepared by plasma-enhanced chemical vapor deposition. Tetravinylsilane was used as a monomer. Two sets of samples were prepared. Samples of the first set were prepared at different effective powers from pure tetravinylsilane and samples of the second set were prepared from deposition mixture of tetravinylsilane with different oxygen content at constant effective power. The film thickness was evaluated by spectroscopic ellipsometry and chemical structure by infrared spectroscopy. A scratch test was used to determine adhesion characterized by the critical normal load. An appearance of performed scratches was obtained by atomic force microscopy (AFM). Film adhesion influenced by the effective power and oxygen content in deposition mixture was discussed based on the received data.

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