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Electrostatic Deflection and Correction Systems
Badin, Viktor ; Oral, Martin (referee) ; Zlámal, Jakub (advisor)
The aim of this master's thesis is to explore and study dynamic aberration correction options in electron-beam lithography systems. For the calculations, the thesis uses the optical column of the BS600 electron-beam writer. The thesis focuses on corrections of the third order field curvature, astigmatism, and distortion aberrations of the currently used magnetic deflection system and a newly designed electrostatic deflection system. The parameters of the two deflection and correction systems were compared.
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Lift-Off technique using different e-beam writers
Chlumská, Jana ; Kolařík, Vladimír ; Krátký, Stanislav ; Matějka, Milan ; Urbánek, Michal ; Horáček, Miroslav
This paper deals with lift–off technique performed by the way of electron beam lithography. Lift–off is a technique mainly used for preparation of metallic patterns and unlike etching it is an additive technique using a sacrificial material – e.g. e–beam resist PMMA. In this paper we discussed technique of preparation of lift–off mask on two different e–beam writing systems. The first system was BS600 – e–beam writer with rectangular variable shaped beam working with 15keV. The second system was Vistec EBPG5000+ HR – e–beam writer with Gaussian shape beam working with 50 keV and 100 keV. The PMMA resist single layer and bi–layer was used for the lift–off mask preparation. As a material for creation of metallic pattern, magnetron sputtered chromium was used. Atomic force microscope, scanning electron microscope and contact profilometer were used to measure and evaluate the results of this process.
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