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Spectroscopy of VOC degradation by surface discharge catalyzed by TiO2
Veverková, Radka ; Slavíček, Pavel (referee) ; Kozáková, Zdenka (advisor)
Bachelor thesis is focused on the study of degradation of volatile organic compounds in surface discharge catalysed by TiO2. Volatile organic compounds are dangerous both for human beings and the environment. Therefore it is necessary to eliminate volatile organic compounds. Plasma technology is one of the options how to reach their efficient removal. The experiment was carried out in the plasma reactor with electrodes for surface discharge. One or two layers of TiO2 catalyst were deposited on one of the electrodes. Nitrogen was used as a carrier gas and it was mixed with air before entering the reactor. The radiation emitted by the discharge during the degradation of VOC was transmitted via optical fibre to the optical emission spectrometer Jobin Yvon TRIAX 550. Toluene, hexane, cyklohexane and xylene were used as model VOCs. During the experiment the impact of input power on catalysed or non-catalysed degradation of VOC by the discharge has been monitored. Using optical emission spectrometry it is possible to determine some important parameters of surface discharge, such as rotation and vibration temperature. The values were determined for each measurement in the range from 650 to 1050 K for rotation temperature and from 1600 to 1950 K for vibration temperature. The average error of determination was 100 K for rotation temperature and 120 K for vibration temperature. It was found, that the catalyst is without effect on the rotation and vibration temperature. In contrast, change of discharge input power significantly influenced both rotation and vibration temperature. Significantly different values of rotation and vibration temperature were obtained in the presence of particular compound for lower input power, while these values were similar for higher input power. Further, the spectral bands of nitrogen, oxygen and NO were identified from emission spectra. The obtained results may be used as a fundament for further study of volatile organic compounds decomposition in surface discharge.
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Plasma chemical deposition of thin fluorocarbone films
Veverková, Radka ; Přikryl, Radek (referee) ; Krčma, František (advisor)
Deposition of thin films is one of the most widespread applications used for the changes of surface properties of various materials. This diploma thesis is focused on diagnosing of thin film generated by a PECVD technique. The capacitively coupled RF discharge at low pressure was used for the thin films deposition using tetrafluoromethane (CF4) with addition of hydrogen (H2) as a precursor. The aim of the work was the search of optimal conditions for a hydrophobic thin layer preparation on the surface of polymer NOA. The depositions were performed in continuous and pulsed mode with different duty cycle. The discharge was monitored using optical emission spectroscopy and in situ mass spectrometry. Thin films structure and properties were characterized using water contact angle measurements, X-ray photoelectron spectroscopy, infrared spectroscopy and optical ellipsometry. The influence of varying power, gas mixture composition and discharge mode were investigated. Water contact angle was the highest for a deposition in a continuous mode. Decomposition processes inside the reactor were observed by using mass spectrometry and optical emission spektrokopie. X-ray photoelectron spectroscopy provided information about the chemical bonds represented on the surface of sample. These were mainly C – C/C – H, C – O, O = C - O groups for sample without layer. Other chemical bonds were observed after the deposition. These were mainly C – CF, CF2 and CF3 groups. The film thickness of about 8,2 nanometers was measured by optical ellipsometry. The obtained results may be used as a fundament for further more advanced study of plasma chemically prepared thin fluorocarbon films and their properties.
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Plasma chemical deposition of thin fluorocarbone films
Veverková, Radka ; Přikryl, Radek (referee) ; Krčma, František (advisor)
Deposition of thin films is one of the most widespread applications used for the changes of surface properties of various materials. This diploma thesis is focused on diagnosing of thin film generated by a PECVD technique. The capacitively coupled RF discharge at low pressure was used for the thin films deposition using tetrafluoromethane (CF4) with addition of hydrogen (H2) as a precursor. The aim of the work was the search of optimal conditions for a hydrophobic thin layer preparation on the surface of polymer NOA. The depositions were performed in continuous and pulsed mode with different duty cycle. The discharge was monitored using optical emission spectroscopy and in situ mass spectrometry. Thin films structure and properties were characterized using water contact angle measurements, X-ray photoelectron spectroscopy, infrared spectroscopy and optical ellipsometry. The influence of varying power, gas mixture composition and discharge mode were investigated. Water contact angle was the highest for a deposition in a continuous mode. Decomposition processes inside the reactor were observed by using mass spectrometry and optical emission spektrokopie. X-ray photoelectron spectroscopy provided information about the chemical bonds represented on the surface of sample. These were mainly C – C/C – H, C – O, O = C - O groups for sample without layer. Other chemical bonds were observed after the deposition. These were mainly C – CF, CF2 and CF3 groups. The film thickness of about 8,2 nanometers was measured by optical ellipsometry. The obtained results may be used as a fundament for further more advanced study of plasma chemically prepared thin fluorocarbon films and their properties.
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Spectroscopy of VOC degradation by surface discharge catalyzed by TiO2
Veverková, Radka ; Slavíček, Pavel (referee) ; Kozáková, Zdenka (advisor)
Bachelor thesis is focused on the study of degradation of volatile organic compounds in surface discharge catalysed by TiO2. Volatile organic compounds are dangerous both for human beings and the environment. Therefore it is necessary to eliminate volatile organic compounds. Plasma technology is one of the options how to reach their efficient removal. The experiment was carried out in the plasma reactor with electrodes for surface discharge. One or two layers of TiO2 catalyst were deposited on one of the electrodes. Nitrogen was used as a carrier gas and it was mixed with air before entering the reactor. The radiation emitted by the discharge during the degradation of VOC was transmitted via optical fibre to the optical emission spectrometer Jobin Yvon TRIAX 550. Toluene, hexane, cyklohexane and xylene were used as model VOCs. During the experiment the impact of input power on catalysed or non-catalysed degradation of VOC by the discharge has been monitored. Using optical emission spectrometry it is possible to determine some important parameters of surface discharge, such as rotation and vibration temperature. The values were determined for each measurement in the range from 650 to 1050 K for rotation temperature and from 1600 to 1950 K for vibration temperature. The average error of determination was 100 K for rotation temperature and 120 K for vibration temperature. It was found, that the catalyst is without effect on the rotation and vibration temperature. In contrast, change of discharge input power significantly influenced both rotation and vibration temperature. Significantly different values of rotation and vibration temperature were obtained in the presence of particular compound for lower input power, while these values were similar for higher input power. Further, the spectral bands of nitrogen, oxygen and NO were identified from emission spectra. The obtained results may be used as a fundament for further study of volatile organic compounds decomposition in surface discharge.
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