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Příprava a vlastnosti heterostruktur GaInP.sub.2./sub./GaAs
Nohavica, Dušan ; Gladkov, Petar ; Žďánský, Karel
Growth of the Ga.sub.x./sub.In.sub.1-x./sub.P/GaAs(100) heterostructures from the liquid phase was optimized at 800.sup.o./sup.C to obtain thick epitaxial layers. Experimental conditions for growth of the mirror like, morphological defects free structures are very narrow. Capping of the ternary layer by GaAs grown from the Bi or Bi-Ga melt was investigated as well. New model of the substrate planarity related defects has been suggested.

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