|
|
Plasmonic structures fabricated by e-beam lithography
Šimík, Marcel ; Urbánek,, Michal (referee) ; Krátký, Stanislav (advisor)
The presented study deals with the process of the formation of plasmonic structures using electron beam lithography. The main aim of this work is to create a structure published in NatureNanotechnology using PMMA resist. It has been created several variants of these structures with different exposure doses and shapes in order to determine the best option. From these variants it is concluded which one is the most effective by using optical and electron microscopy. With this information are created and evaluated large-scale exposure.
|
|
|
The contrast curves determination for e-beam writer with Gaussian beam
Šuľan, Dušan ; Horáček,, Miroslav (referee) ; Krátký, Stanislav (advisor)
This work deals with technological process of structures creating by using of electron beam lithography. The main focus of the work is contrast curves of PMMA resist determination for electron beam lithography system Vistec EBPG 5000+ ES. Contrast curves are determined for different developers, developing times and the depths of resist. Sensitivity and the contrast of resist are determined from these contrast curves for each resist-developer system. Sensitivity curves are applied to the proximity effect correction on real structures, specifically the periodic diffraction gratings and then they are evaluated.
|
|
|
The contrast curves determination for e-beam writer with Gaussian beam
Šuľan, Dušan ; Horáček,, Miroslav (referee) ; Krátký, Stanislav (advisor)
This work deals with technological process of structures creating by using of electron beam lithography. The main focus of the work is contrast curves of PMMA resist determination for electron beam lithography system Vistec EBPG 5000+ ES. Contrast curves are determined for different developers, developing times and the depths of resist. Sensitivity and the contrast of resist are determined from these contrast curves for each resist-developer system. Sensitivity curves are applied to the proximity effect correction on real structures, specifically the periodic diffraction gratings and then they are evaluated.
|
|
|
Plasmonic structures fabricated by e-beam lithography
Šimík, Marcel ; Urbánek,, Michal (referee) ; Krátký, Stanislav (advisor)
The presented study deals with the process of the formation of plasmonic structures using electron beam lithography. The main aim of this work is to create a structure published in NatureNanotechnology using PMMA resist. It has been created several variants of these structures with different exposure doses and shapes in order to determine the best option. From these variants it is concluded which one is the most effective by using optical and electron microscopy. With this information are created and evaluated large-scale exposure.
|
guest ::
