Národní úložiště šedé literatury Nalezeno 3 záznamů.  Hledání trvalo 0.00 vteřin. 
Optimization of reliefs of thin polymer films of resist for phase diffractive optical elements
Matějka, František ; Matějková, Jiřina
Electron beam lithography uses polymer electron resists mostly for recording of picture information. The behaviour of these polymer electron resists, under influence of the electron of the given energy, is expressed by the sensitivity curve. The curve of sensitivity is constructed as dependence of the relative change of thickness of the functional layer of resist, on the density of the absorbed energy.
Electron optical design of a compact LEEM
Adamec, P. ; Bauer, E. ; Lencová, Bohumila
Pavel Adamec spent most of his Ph.D. study in Clausthal and later in ASU Tempe. The aim of his Ph.D. project was to design a small compact LEEM that could be fitted to an UHV system, i.e. the sample must be on ground potential and the optics should fit to a standard UHV flange. The design has to use "floating" electrostatic lenses and it must be of compact size and low weight.
Study of electron optical properties of the Wien filter
Vlček, Ivan ; Lencová, Bohumila
The Wien filter is an electron optical element consisting of electrostatic and magnetic multipole fields. The study of electron optical properties of the Wien filter is motivated by the use of the Wien filter in the low energy scanning electron microscope for the separation of primary and signal electrons.

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