|
|
Characterization of VTR-7000 deposition furnace
Petrová, Lenka ; Ulrych, Jan (oponent) ; Semiconductor, Vlastimil Hanáček, ON (vedoucí práce)
This bachelor’s thesis deals with the problem of adjusting of a CVD (chemical vapor deposition) reactor for operations in a given plant. The problem is that precise machines such as a CVD reactor have to be adjusted for function in the place, where they will be operated. This can be done by using statistical tools such as the DOE (design of experiment). There is a range of inputs that can affect the results of the deposition process. From these some will have to be selected as constants and some will become variables in the DOE. The target of this project is to introduce the reader to the topic of CVD, then, from previous DOE done on such machine in the COM1, design an experiment to adjust the machine in CZ4 WFAB for production, evaluate the acquired data and obtain the ideal setting for the reactor. The reader will be indirectly introduced also to DMAIC process since the DMAIC was used to evaluate the actual experiment in ON Semiconductor, Rožnov pod Radhoštěm, CZ4 WFAB.
|
|
|
Characterization of VTR-7000 deposition furnace
Petrová, Lenka ; Ulrych, Jan (oponent) ; Semiconductor, Vlastimil Hanáček, ON (vedoucí práce)
This bachelor’s thesis deals with the problem of adjusting of a CVD (chemical vapor deposition) reactor for operations in a given plant. The problem is that precise machines such as a CVD reactor have to be adjusted for function in the place, where they will be operated. This can be done by using statistical tools such as the DOE (design of experiment). There is a range of inputs that can affect the results of the deposition process. From these some will have to be selected as constants and some will become variables in the DOE. The target of this project is to introduce the reader to the topic of CVD, then, from previous DOE done on such machine in the COM1, design an experiment to adjust the machine in CZ4 WFAB for production, evaluate the acquired data and obtain the ideal setting for the reactor. The reader will be indirectly introduced also to DMAIC process since the DMAIC was used to evaluate the actual experiment in ON Semiconductor, Rožnov pod Radhoštěm, CZ4 WFAB.
|
host ::
RSS.