National Repository of Grey Literature 86 records found  1 - 10nextend  jump to record: Search took 0.00 seconds. 
High Efficiency n-type Monocrystalline Silicon Solar Cells
Mojrová, Barbora ; Kolařík, Vladimír (referee) ; Poruba,, Aleš (referee) ; Boušek, Jaroslav (advisor)
Tato dizertační práce je zaměřena vývoj a ověřování nových postupů přispívajících ke zvýšení účinnosti bifaciálních solárních článků založených na monokrystalickém křemíku n-typové vodivosti. Tato práce přináší nové poznatky o vylepšených výrobních procesech a postupech použitých během výroby článků v ISC Konstanz. V rámci práce byly vyrobeny solární články typu n-PERT (Passivated Emitter Rear Totally diffused) s vysokou účinností, a to pomocí standartních procesů a zařízení používaných běžně při průmyslové výrobě. Zapojení těchto průmyslových postupů a metod umožnilo ověřit možnosti výroby n-typových článků za použití téměř totožného vybavení, jaké je potřeba pro výrobu p-typových článků. Zvýšení účinnosti bylo založeno především na vylepšení jednotlivých procesních kroků. Experimenty popsané v této práci dosvědčují zlepšení procesu difúze bóru, přizpůsobení parametrů pasivační a antireflexní vrstvy nově navrženému emitoru, zlepšení procesu metalizace ve smyslu využití past neobsahujících hliník, testování tisku rozličných motivů spolu s různými sekvencemi výpalu. V rámci práce byla testována možnost zamezení jevu potenciální indukované degradace (Potential Induced Degradation – PID) pomocí vhodného složení ARC a pasivační vrstvy. Vyrobené n-typové solární články dosáhly maximální hodnoty účinnosti 20,9 %.
SMV-2019-05: Phase grids
Krátký, Stanislav ; Matějka, Milan ; Chlumská, Jana ; Horáček, Miroslav ; Kolařík, Vladimír ; Meluzín, Petr ; Král, Stanislav
Development of phased gratings manufacturing for use in transient grating spectroscopy. Possible approaches for phased gratings design were studied during the development to achieve the maximum efficiency for two different wavelengths. Theoretic simulations showed that the grating has to be adjusted for the value of wavelength (the depth of the grating) between two desired values of wavelength to achieve the maximum efficiency in first diffractive orders. The samples were manufactured with use of e-beam lithography and reactive ion etching.
SMV-2019-04: Large-area nanostructures preparing
Horáček, Miroslav ; Kolařík, Vladimír ; Matějka, Milan ; Krátký, Stanislav ; Chlumská, Jana ; Meluzín, Petr ; Král, Stanislav
The development of sandwich nanostructures on doped silicon substrate. The dimension of nanostructures and their pitch is very close to the capability of used e-beam system Raith EBPG5000+. Thin silicon nitride layer was prepared on doped silicon substrate. This layer is needed for wet etching of silicon. The golden markers needed for direct writing of multiple patterns were prepared by the way of e-beam lithography and vacuum evaporation. Mask in the resist layer was exposed for etching of the silicon nitride mask by reactive ion etching in the next step. Wet etching of silicon was carried out after the mask was prepared. Small pyramids were created by the etching process. The last lithography step was preparation of the mask over the pyramids. Thin aluminum layer in the areas where the pyramids are presented was prepared by the way of vacuum evaporation and lift-off technique.
SMV-2019-03: Thin membranes
Krátký, Stanislav ; Matějka, Milan ; Chlumská, Jana ; Horáček, Miroslav ; Kolařík, Vladimír ; Meluzín, Petr ; Král, Stanislav
The development of technology for preparation of very thin silicon nitride membrane for use in low energy electron spectroscopy. Several techniques for preparation of thin membranes were tested during the development – wet etching, reactive ion etching, plasma etching, low-frequency plasma etching. Comparative method for the measurement of such thin membranes was developer also.
Silver micro drop structured twice around the earth
Meluzín, Petr ; Tryhuk, V. ; Horáček, Miroslav ; Knápek, Alexandr ; Krátký, Stanislav ; Matějka, Milan ; Kolařík, Vladimír
Planar micro structuring of thin metallic layers allows to achieve required surface properties of metallic layers covering bulk materials. Recently, the arrangement of micro holes or pillars placed around the primary spiral according to a phyllotactic model was presented. This deterministically aperiodic planar arrangement was used for benchmarking purposes of the e-beam writer patterning. This arrangement based on single primary spiral and a variety of derived secondary spirals has several interesting properties. One of them is a very low ratio between the area populated by individual micro elements and the length of the primary phyllotactic spiral. This paper presents analysis of the phyllotactic spiral length and the rising gradient at the spiral outer edge. The practical part of the presented work deals with the patterning of a thin silver layer deposited on the silicon or glass substrates using e-beam pattern generation, lithography techniques and related technologies. An interesting impact of the mentioned spiral properties on the e-beam writing strategies and the exposure ordering strategy are also discussed.
Photolitography on flexible substrates
Urbánek, M. ; Urbánek, P. ; Kuřitka, I. ; Kolařík, Vladimír
Nowadays preparation of structures on flexible substrates is highly demanded because of using this patterns in field of flexible electronics. This contribution deals with photolitographic procces for preparation of structures on flexible substrates. The method of photolitography enables to create designed patterns in various material (e.g. metals as conductive layers) on various substrates (silicon wafers, foils, etc.). First the designed pattern is exposed through the mask by UV light into polymer resist, then the pattern is transfered into metal layer by wet etching through the developed windows in resist. In this paper several patterns are prepared through the positive resist PMMA by photolitography into various metal layer (Cu, Al) on flexible substrates.
SMV-2018-05: Development of test specimens for SEM
Matějka, Milan ; Horáček, Miroslav ; Meluzín, Petr ; Chlumská, Jana ; Král, Stanislav ; Kolařík, Vladimír ; Krátký, Stanislav ; Knápek, Alexandr
Development in the field realization of precise relief structures in the silicon dedicated to the testing of the scanning electron microscopes (SEM) deflection field and accuracy. Micro-lithographic techniques for the recording of patterns in the silicon were used. New tools for handling during technological operations of resist deposition and etching were developed. Optimization was reached in the process of transfer of the relief structure into silicon via anisotropic etching, due modification of etching apparatus. Standardized procedures for inspection and quality control were developed.
SMV-2018-04: Planar microstructures for optical applications
Horáček, Miroslav ; Kolařík, Vladimír ; Matějka, Milan ; Krátký, Stanislav ; Chlumská, Jana ; Meluzín, Petr ; Král, Stanislav ; Fořt, Tomáš ; Oulehla, Jindřich ; Pokorný, Pavel
The development of planar microstructures for optical applications, and subsequent realization of samples by the way of e-beam lithography and other techniques. Project deals with material study suited for the fabrication of planar microstructures in thin metallic layer with respect to achievable resolution and fulfilling the absorbance parameters for particular application. E-beam lithography is used for preparation the motif in resist layer, which is masking layer for the etching of metallic layer by various techniques (wet etching, reactive ion etching). Technical documentation of developed processes and prepared samples are also the part of the project.
SMV-2018-03: Optimization of difractive optical elements fabrication
Horáček, Miroslav ; Kolařík, Vladimír ; Matějka, Milan ; Krátký, Stanislav ; Chlumská, Jana ; Meluzín, Petr ; Král, Stanislav
Research and development in the field of diffractive optical elements fabrication by the way of e-beam lithography with respect to replication possibilities of various types of structures. Project deals with data preparation optimization for diffractive gratings with various profile’s shape. Various types of diffractive gratings are prepared by e-beam lithography. They will serve as a metric standard for replicas prepared by electroforming and foil stamping. Prepared samples are analyzed by atomic force microscope and scanning electron microscope.
SMV-2018-02: Analysis of planar microstructures prepared by compound writing method
Horáček, Miroslav ; Kolařík, Vladimír ; Matějka, Milan ; Krátký, Stanislav ; Chlumská, Jana ; Meluzín, Petr ; Král, Stanislav
Research and development of materials, techniques and methodology for planar microstructures preparatio. Preparation and evaluation of a thin layers for planar microstructures making, analysis of microstructures using scanning electron microscopy and confocal microscopy, preparation of the masks for compound exposures by means of electron beam lithography, utiilization of UV mask aligner, RIE, etc., verification of the proposed methodology, evaluation of the final parameters.\n\n

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2 Kolařík, Vít
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