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National Repository of Grey Literature 4 records found  Search took 0.01 seconds. 
Deposition of Ga and GaN nanostructures on graphene substrate treated by atomic hydrogen
 Bárdy, Stanislav ; Váňa, Rostislav (referee) ; Mach, Jindřich (advisor)
In this work we studied gallium on graphene. Depositions were done by Molecular beam epitaxy. We observed Raman enhancement and peak shifts by individual Ga islands. Simulation confirmed our assumption, that the enhancement is based on plasmonics effect that is also the main contribution of Surface-enhanced Raman spectroscopy. Another result is hydrogenation of graphene before deposition does have an effect on Ga structure and reduces diffusion length of Ga atoms.
Detailed record
Design of aparature for RF plasma etching
 Bárdy, Stanislav ; Bábor, Petr (referee) ; Mach, Jindřich (advisor)
This bachelor's thesis deals with a design of an ICP (Inductively Coupled Plasma) apparatus. The theoretical part consists of a research of a plasmatic graphene surface cleaning. Next are described plasma generation methods and an RF circuit design. The experimental part deals with a construction of the ICP apparatus and the impedance matching box, an optical diagnostics of a plasma discharge and a measurement of PMMA etching parameters (etch rate, roughness) by a spectroscopic reflectometry and an atomic force microscopy.
Detailed record
Deposition of Ga and GaN nanostructures on graphene substrate treated by atomic hydrogen
 Bárdy, Stanislav ; Váňa, Rostislav (referee) ; Mach, Jindřich (advisor)
In this work we studied gallium on graphene. Depositions were done by Molecular beam epitaxy. We observed Raman enhancement and peak shifts by individual Ga islands. Simulation confirmed our assumption, that the enhancement is based on plasmonics effect that is also the main contribution of Surface-enhanced Raman spectroscopy. Another result is hydrogenation of graphene before deposition does have an effect on Ga structure and reduces diffusion length of Ga atoms.
Detailed record
Design of aparature for RF plasma etching
 Bárdy, Stanislav ; Bábor, Petr (referee) ; Mach, Jindřich (advisor)
This bachelor's thesis deals with a design of an ICP (Inductively Coupled Plasma) apparatus. The theoretical part consists of a research of a plasmatic graphene surface cleaning. Next are described plasma generation methods and an RF circuit design. The experimental part deals with a construction of the ICP apparatus and the impedance matching box, an optical diagnostics of a plasma discharge and a measurement of PMMA etching parameters (etch rate, roughness) by a spectroscopic reflectometry and an atomic force microscopy.
Detailed record

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