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SMV-2018-05: Development of test specimens for SEM
 Matějka, Milan ; Horáček, Miroslav ; Meluzín, Petr ; Chlumská, Jana ; Král, Stanislav ; Kolařík, Vladimír ; Krátký, Stanislav ; Knápek, Alexandr
Development in the field realization of precise relief structures in the silicon dedicated to the testing of the scanning electron microscopes (SEM) deflection field and accuracy. Micro-lithographic techniques for the recording of patterns in the silicon were used. New tools for handling during technological operations of resist deposition and etching were developed. Optimization was reached in the process of transfer of the relief structure into silicon via anisotropic etching, due modification of etching apparatus. Standardized procedures for inspection and quality control were developed.
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