National Repository of Grey Literature 4 records found  Search took 0.00 seconds. 
Creating themes thin-film methods
Ondráček, Michal ; Šimonová, Lucie (referee) ; Šubarda, Jiří (advisor)
The master’s thesis deals with the theory of thin film technology, especially creating these layers. The work includes the distribution of vacuum deposition techniques for physical (PVD) and chemical (CVD). The main aim is to create a theme in different ways of implementation by using magnetron sputtering device, and these motives evaluated in terms of the quality of sputtering.
Characterisation of dielectric films on a silicon wafer
Fillner, Patrik ; Boušek, Jaroslav (referee) ; Hubálek, Jaromír (advisor)
This bachelor thesis focuses on thin oxide based dielectric layers on silicon wafer. Main effort is for characterization of properties of samples. This technology can be used for manufacturing capacitors on silicon chips. Samples are based on planar oxide layers made with thin film technology on single silicon wafers coated with electrodes deposited by evaporation or by sputtering.
Characterisation of dielectric films on a silicon wafer
Fillner, Patrik ; Boušek, Jaroslav (referee) ; Hubálek, Jaromír (advisor)
This bachelor thesis focuses on thin oxide based dielectric layers on silicon wafer. Main effort is for characterization of properties of samples. This technology can be used for manufacturing capacitors on silicon chips. Samples are based on planar oxide layers made with thin film technology on single silicon wafers coated with electrodes deposited by evaporation or by sputtering.
Creating themes thin-film methods
Ondráček, Michal ; Šimonová, Lucie (referee) ; Šubarda, Jiří (advisor)
The master’s thesis deals with the theory of thin film technology, especially creating these layers. The work includes the distribution of vacuum deposition techniques for physical (PVD) and chemical (CVD). The main aim is to create a theme in different ways of implementation by using magnetron sputtering device, and these motives evaluated in terms of the quality of sputtering.

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