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Preparation of optical thin films by chemical vapor deposition
Koryčánek, Adam ; Kvapil, Michal (referee) ; Kolíbal, Miroslav (advisor)
This work is focused on the comparison between physical vapor deposition methods of thin antireflective layers and chemical vapor deposition (CVD) methods, for applications in the field of optics. The work begins with basic concepts and principles related to anti-reflective coatings, their deposition and characterization. Furthermore, in the experimental part, the techniques of ellipsometry, atomic force microscopy (AFM) and X-ray photoelectron spectroscopy (XPS) are used to characterize the properties of the layers and their comparison.

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