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Electroless selective deposition of silver nanoparticles
Salajková, Zita ; Bartoš, Miroslav (referee) ; Kolíbal, Miroslav (advisor)
Silver nanoparticles have a widespread use in the field of plasmonics. Since deposition of nanoparticles from colloidal solutions onto an exact location on a substrate is difficult, it seems advantageous to grow the nanoparticles in-situ. The presented work is focussed at selective deposition of~silver nanoparticles from colloidal solution or from solution reach of silver ions under assistance of focussed electron beams. Successful deposition could lead to growth of well defined nanostructures directly at the substrate surface. The effect of electron beam intensity to surface quality is studied (silica reduction, surface morphology) as well as effect of pH to particle properties. Outputs are used as a part in theoretical description of selective deposition and confirmed by following advanced experiments. The light assisted deposition and growth of nanostructures is described at the end of the presented work.
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Fabrication of micro- and nanostructures by different etching methods
Těšík, Jan ; Urbánek, Michal (referee) ; Šamořil, Tomáš (advisor)
The selective etching is currently very widely used method for the preparation of micro- and nanostructures. This thesis deals with the principles of the etching methods, their applications and also the possibilities of dry and wet etching at the Institute of Physical Engineering. The experimental part is devoted to the preparation of the etching masks to ensure etching selectivity and to the preparation of pre-defined micro- and nanostructures. Important parameters were determined from the results, e.g. Si etch rate, selectivity of the masks etc. Further, the suitability of the used methods and etching masks were compared.
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Functionalized nanostructures
Váňa, Rostislav ; Kvapil, Michal (referee) ; Kolíbal, Miroslav (advisor)
This thesis deals with functionalized nanoparticles. In the first part there are mentioned materials suitable for a functionalization, the usage of functionalized nanoparticles in medicine and biochemistry and detection methods of changes of optical properties. In the second part changes of optical properties after functionalization are investigated by spectroscopic ellipsometry and FTIR spectroscopy.
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Fabrication of SiO2 by anisotropic etching of silicon
Balajka, Jan ; Kolíbal, Miroslav (referee) ; Urbánek, Michal (advisor)
The aim of the bachelor's thesis is the fabrication of silicon dioxide (SiO2) membranes on silicon (Si) substrate by anisotropic etching of silicon. Masks for anisotropic silicon etching were prepared by electron beam litography and SiO2 wet etching. Individual steps of membrane fabrication are described, including used experimental conditions. In order to optimize the fabrication process, etch rates of Si/SiO2 in several solutions were measured. Results of the measurements are included in the thesis. Fabricated membranes were characterised by optical microscopy, scanning electron microscopy and spectroscopic reflectometry. Methods used for fabrication and analysis of defined structures created by anisotropic silicon etching are briefly summarized.
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Preparation of Ag/Co/Ag Trilayers
Burda, Pavel ; Kolíbal, Miroslav (referee) ; Čechal, Jan (advisor)
The Bachelor's thesis is aimed to the preparation of silver and cobalt ultrathin films. The films are formed on modified surfaces of crystalline silicon substrates (SiO2/Si(111), Si(111) ?H, Si(111) 7×7) and amorphous SiO2 in a form of a quartz glass. Thin films are grown using an effusion cell for Molecular Beam Epitaxy (MBE). Surface modified surfaces are covered subsequently by a silver, cobalt and silver thin layer. The individual film thickness is 6 nm. Consequently the samples are studied by the X-ray Photoelectron Spectroscopy (XPS) and the Atomic Force Microscopy (AFM). The morphology of thin films and growth modes are compared among the substrates. Growth modes change with the surface modification type. Complete trilayer system Ag/Co/Ag was prepared on SiO2/Si(111) and Si(111) 7×7. Such system can be employed in plasmonics in order to allow the control of surface plasmon polariton properties by an external magnetic field.
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