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Manufacturing of Relief Diffractive Structures for Optical Elements Using Electron Beam Lithograph
Daněk, Lukáš ; Urban, František (referee) ; Klapetek,, Petr (referee) ; Kolařík, Vladimír (advisor)
This thesis describes several techniques for the optimization of the manufacturing of relief diffractive structures used as optical elements by Electron beam lithograph BS600 in the Electron beam laboratory of the Institute of Scientific Instruments of the Academy of Sciences of the Czech Republic. The Electron beam lithograph BS600 was originally developed and constructed in the Institute of Scientific Instruments of the Academy of Sciences of the Czech Republic for Tesla in 1983, but is still developing, which was published. The Electron been lithograph BS600 is specific in these days because of its accelerating potential and is unique in the world because of the possibility to shape the beam. The optimization of manufacturing of relief diffractive structures, used as optical elements, was mostly reached by analysis, bringing optimal solution for the required effect. Moreover, an algorithm was developed for driving the electron beam position, shape, size and the time of each elementary exposition. The analysis showed that is convenient to use mathematical description of separate lines of diffractive structures. A separate subject was carried out for the calibration of the exposition field of the Electron beam lithograph BS600.
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Manufacturing of Relief Diffractive Structures for Optical Elements Using Electron Beam Lithograph
Daněk, Lukáš ; Urban, František (referee) ; Klapetek,, Petr (referee) ; Kolařík, Vladimír (advisor)
This thesis describes several techniques for the optimization of the manufacturing of relief diffractive structures used as optical elements by Electron beam lithograph BS600 in the Electron beam laboratory of the Institute of Scientific Instruments of the Academy of Sciences of the Czech Republic. The Electron beam lithograph BS600 was originally developed and constructed in the Institute of Scientific Instruments of the Academy of Sciences of the Czech Republic for Tesla in 1983, but is still developing, which was published. The Electron been lithograph BS600 is specific in these days because of its accelerating potential and is unique in the world because of the possibility to shape the beam. The optimization of manufacturing of relief diffractive structures, used as optical elements, was mostly reached by analysis, bringing optimal solution for the required effect. Moreover, an algorithm was developed for driving the electron beam position, shape, size and the time of each elementary exposition. The analysis showed that is convenient to use mathematical description of separate lines of diffractive structures. A separate subject was carried out for the calibration of the exposition field of the Electron beam lithograph BS600.
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