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Diffractive Optics: Analysis, Design and Fabrication of Diffractive Optical Elements
Fiala, P. ; Matějka, František ; Richter, I. ; Škereň, M.
This contribution presents results obtained in the field of diffractive optics, covering practically all aspects of the analysis, design and realization process of the diffractive optical elements (DOEs). As for the analysis, using the rigorous diffraction methods, we have recently been able to efficiently analyze various diffraction gratings. Concerning the synthesis, several design strategies have been studied and implemented for designing both binary and multi-level phase DOEs. Using the numerically computed designs, E-beam lithography technology has been chosen for fabricating both binary and multi-level phase DOEs, using the BS 600 e-beam lithographic facility at ISI AS CR. Finally, some typical examples of optical reconstructions are presented and discussed.
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Test Specimens for SEM
Matějka, František ; Ryzí, Z.
In most applications SEM devices are utilized in the area of magnification quite far from the high limit. For such cases we prepare objects interesting for SEM by using special techniques of microfabrication. Those objects can be called test patterns. Compared with natural objects, they have an advantage: their geometry and dimensions are determined with high precision. Another advantage may be that the test pattern can be created from materials with well known properties. In our laboratories we prepare test specimens using electron-beam lithography and the anisotropic etching of silicon and using holographic techniques. We have designed the topography of anisotropically etched measuring test specimen ".mu.-scale".In most applications SEM devices are utilized in the area of magnification quite far from the high limit. For such cases we prepare objects interesting for SEM by using special techniques of microfabrication. Those objects can be called test patterns. Compared with natural objects, they have an advantage: their geometry and dimensions are determined with high precision. Another advantage may be that the test pattern can be created from materials with well known properties. In our laboratories we prepare test specimens using electron-beam lithography and the anisotropic etching of silicon and using holographic techniques. We have designed the topography of anisotropically etched measuring test specimen ".mu.-scale".
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