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Národní úložiště šedé literatury Nalezeno 3 záznamů.  Hledání trvalo 0.01 vteřin. 
LHC Abort Gap Monitor acquisition system
 Pacner, Petr ; Vágnerová, Jitka (oponent) ; Kubíček, Michal (vedoucí práce)
The Beam Dump System of the LHC Large Hadron Collider is one of its critical systems. It is responsible for changing the trajectory of the beam towards the beam dump. For its functionality it uses an Abort Gap - a space with no particles within a beam structure. This gap is formed during the injection of the particles into the LHC. The injection is never ideal hence Abort Gap always contains some particles. Energy accumulated in the Abort Gap can cause various damages and so its amount has to be continuously estimated. This is the purpose of an Abort Gap Monitor. The currently deployed Abort Gap Monitor uses analog integrators to measure the particle population. This makes the instrument difficult to calibrate due to its hardware inaccuracies. To improve the system measurement versatility and reproducibility the effort is made to create an acquisition system with digital integration. This work aims to design, verify and implement the digital acquisition system. The digital acquisition system serves as one of the major parts of the new CERN SY-BI group Abort Gap Monitor. This document is split into four sections. The first briefly describes the structure of the Beam Dump System and the importance of the Abort Gap. The second section explains the principle of Abort Gap measurements and the data evaluation methodology. The third section describes the current system design and its issues. Then it focuses on the new Abort Gap Monitor topology followed by acquisition system development. The last section presents the simulations and measurements obtained with the new Abort Gap Monitor Acquisition System and discusses further development steps.
Úplný záznam
LHC Abort Gap Monitor acquisition system
 Pacner, Petr ; Vágnerová, Jitka (oponent) ; Kubíček, Michal (vedoucí práce)
The Beam Dump System of the LHC Large Hadron Collider is one of its critical systems. It is responsible for changing the trajectory of the beam towards the beam dump. For its functionality it uses an Abort Gap - a space with no particles within a beam structure. This gap is formed during the injection of the particles into the LHC. The injection is never ideal hence Abort Gap always contains some particles. Energy accumulated in the Abort Gap can cause various damages and so its amount has to be continuously estimated. This is the purpose of an Abort Gap Monitor. The currently deployed Abort Gap Monitor uses analog integrators to measure the particle population. This makes the instrument difficult to calibrate due to its hardware inaccuracies. To improve the system measurement versatility and reproducibility the effort is made to create an acquisition system with digital integration. This work aims to design, verify and implement the digital acquisition system. The digital acquisition system serves as one of the major parts of the new CERN SY-BI group Abort Gap Monitor. This document is split into four sections. The first briefly describes the structure of the Beam Dump System and the importance of the Abort Gap. The second section explains the principle of Abort Gap measurements and the data evaluation methodology. The third section describes the current system design and its issues. Then it focuses on the new Abort Gap Monitor topology followed by acquisition system development. The last section presents the simulations and measurements obtained with the new Abort Gap Monitor Acquisition System and discusses further development steps.
Úplný záznam
Electronic structure of bimetallic systems - study of gas molecule interaction
 Píš, Igor ; Nehasil, Václav (vedoucí práce) ; Bartoš, Igor (oponent) ; Polčík, Martin (oponent)
Práce je věnována studiu bimetalického Rh-V systému pomocí metod fyziky povrchů. Vlastnosti ultra-tenkých Rh-V vrstev nesených na γ-Al2O3 byly porovnány s modelovými systémy připravenými vakuovou depozicí V na Rh(111), Rh(110) a polykrystalické rhodium. Bylo zkoumáno vytváření V-Rh(111)-(2×2), V-Rh(110)-(2×1) a V-Rh(110)-(1×2) podpovrchových slitin a jejich elektronická a atomární struktura. Byly navrženy modely povrchových rekonstrukcí těchto slitin. Dále byl zkoumán vliv vzniku podpovrchové slitiny na interakci s molekulami CO a O2 a vliv adsorpce molekul na tuto slitinu. Vazba mezi CO molekulami a povrchem slitiny byla oslabena v důsledku markantních změn ve struktuře valenčního pásu kovového povrchu. Kyslík adsorbovaný na povrchu slitiny reagoval při zvýšené teplotě s podpovrchovým vanadem, což zabraňovalo interakci kovového substrátu s molekulami CO.
Úplný záznam

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