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Switching of spin vortices in magnetic nanodiscs
Hladík, Lukáš ; Pekárková, Jana (referee) ; Urbánek, Michal (advisor)
The diploma thesis deals with the switching of spin vortices in magnetic nanodisks. First, the basic concepts of (micro)magnetism are defined and existing theoretical and experimental achievements in the field of switching of the two basic characteristics (chirality and polarity) of magnetic vortex are summarized. Then the principle of dynamic switching of magnetic vortex chirality using in-plane magnetic field pulse with a well defined amplitude and duration is presented. There is no need to use a certain shape of nanodisks or asymmetry in magnetic field distribution. Nanostructures were prepared by the multi-step electron beam lithography and ion beam sputtering. Individual steps of sample preparation and optimization for the magnetization dynamics measurements are described. Finally, the experimental measurements of the dynamic switching of chirality on prepared samples obtained by transmission x-ray microscopy at the synchrotron Advanced Light Source at Berkeley, USA are presented and discussed.
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Study of Properties of Surface Plasmon Polaritons on Magnetic Materials
Dvořák, Petr ; Schmidt, Eduard (referee) ; Kalousek, Radek (advisor)
The diploma thesis deals with the experimental study of surface plasmon polaritons (SPPs) on nano-structures with the Au/Co/Au multilayer. Plasmonic structures were prepared by the electron beam lithography and by the focused ion beam. A Scanning optical near-field microscope was used for detection of surface plasmon polaritons. SPPs were confirmed by the experiment with different polarizations of the illuminating light. Furthermore, differences in plasmon interference wavelengths was measured for different surface dielectric functions. Finally, the decantation of the SPPs interference image was measured in dependence on the external magnetic field.
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Electrotransport properties of the nanostructures fabricated by the FIB
Ostřížek, Petr ; Kolíbalová, Eva (referee) ; Urbánek, Michal (advisor)
The aim of this work is fabrication of nanostructures and measurement of their electrotransport properties. There are two different methods used for fabrication - electron beam lithography with sputtering of thin films and focused ion beam with deposition from gas phase. I-V characteristic was measured for characterisation of as prepared nanostructures - wires. Material of wires prepared by using of electron beam lithography was permalloy - an alloy of iron and nickel. Second types of wires prepared by using of chemical vapor deposition induced by focused ion beam was platinum based.
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Fabrication of micro- and nanostructures by different etching methods
Těšík, Jan ; Urbánek, Michal (referee) ; Šamořil, Tomáš (advisor)
The selective etching is currently very widely used method for the preparation of micro- and nanostructures. This thesis deals with the principles of the etching methods, their applications and also the possibilities of dry and wet etching at the Institute of Physical Engineering. The experimental part is devoted to the preparation of the etching masks to ensure etching selectivity and to the preparation of pre-defined micro- and nanostructures. Important parameters were determined from the results, e.g. Si etch rate, selectivity of the masks etc. Further, the suitability of the used methods and etching masks were compared.
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The graphene structures suitable for field effect transistors
Kurfürstová, Markéta ; Bartošík, Miroslav (referee) ; Mach, Jindřich (advisor)
This bachelor’s thesis is focused on preparation of graphene structures suitable for field effect transistors. In the first section, graphene is characterized in terms of its properties and prepataion methods. The second part sums up semiconductor technology, focusing on transistors with graphene layer. Next, electron beam litography method is presented, which had been used for preparation of the structures. Finally, an experimental procedure of graphene structures manufacture is described.
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Creation of plasmonic micro- and nanostructures by electron beam lithography
Babocký, Jiří ; Dvořák, Petr (referee) ; Kvapil, Michal (advisor)
This beachelor’s thesis deals with a fabrication of plasmonic antennas using electron beam lithography. First section consists of summary of a technologies that can be used for production of metallic micro and nanostructures on silicon and glass substrate. Second section provides a description of electron beam lithography method and technologies that are used for it. Final part describes experiments, that were done and empiric model describing dependance of dimension of fabricated structures on lithographic parameters.
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Fabrication of SiO2 by anisotropic etching of silicon
Balajka, Jan ; Kolíbal, Miroslav (referee) ; Urbánek, Michal (advisor)
The aim of the bachelor's thesis is the fabrication of silicon dioxide (SiO2) membranes on silicon (Si) substrate by anisotropic etching of silicon. Masks for anisotropic silicon etching were prepared by electron beam litography and SiO2 wet etching. Individual steps of membrane fabrication are described, including used experimental conditions. In order to optimize the fabrication process, etch rates of Si/SiO2 in several solutions were measured. Results of the measurements are included in the thesis. Fabricated membranes were characterised by optical microscopy, scanning electron microscopy and spectroscopic reflectometry. Methods used for fabrication and analysis of defined structures created by anisotropic silicon etching are briefly summarized.
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