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Ellipsometry of Thin Films
Novotný, Zbyněk ; Navrátil, Karel (referee) ; Nebojsa, Alois (advisor)
Diploma thesis deals with ageing process of thin films of Co and Cu on Si substrate, prepared by the IBAD method. The process of film ageing, which depends on time of exposition to the atmosphere at room conditions, was investigated with spectroscopic ellipsometry (VIS+UV) and atomic force microscopy. In case of thin Co films, approximately four days long incubation period was observed. During this time period, a change in the optical parameters of the film occurs without a measurable change of the film topography. Using non-contact atomic force microscopy, a growth of the transitional film in the island growth regime was observed. During the ageing of thin Cu films, two stages of growth of the transitional layer were observed - nucleation stage and growth stage. Both of these time periods of the transitional layer growth show direct logarithmic dependence. Using non-contact atomic force microscopy, the growth of the transitional film was observed. Using atomic force microscopy in non-contact regime, time dependent measurement was done and the process of forming of one monolayer of the transitional layer was documented. Within the diploma thesis, a series of experiments on ultra high vacuum system were performed in order to investigate phase transformation of thin Fe films (22 monolayers) on Cu(100) stabilized by CO absorption. The transformation from fcc phase to bcc phase was induced by Ar+ ion beam bombardment with the ion energy in the range (0.5-4) keV. The process of phase transformation was observed by surface magneto-optic Kerr effect, Auger electron spectroscopy and low energy electron diffraction.
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Deposition and optical properties of thin films and layered structures by PECVD
Kucharčík, Jan ; Boušek, Jaroslav (referee) ; Čech, Vladimír (advisor)
Thesis in theoretical part is focused on the principle of spectroscopic ellipsometry and formation of thin films by plasma-enhanced chemical vapor deposition (PECVD). In the experimental part we describe the deposition system, ellipsometer and mathematical evaluation of ellipsometric data, materials used for film formation and processing of the samples. Single-layer and multilayer structures of polymeric materials were prepared. We revealed that the optical properties of thin films are independent of film thickness. We also described the effect of the effective power and deposition gas mixture on optical properties of thin films.
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Deposition of Indium Tin Oxide and study of its optical properties
Olivíková, Gabriela ; Kvapil, Michal (referee) ; Dvořák, Petr (advisor)
This work is focused on preparation and deposition of thin layers of indium tin oxide (ITO) by ion beam sputtering (IBS) and ion beam assisted deposition (IBAD). In the theoretical part, the electrical and optical properties, preparation methods, and applications are reviewed. In the experimental part, the optical and transport properties of deposited films are investigated by spectroscopic methods. It is shown that simultaneous bombardment of the surface with oxygen ions with energy 80 eV results in increase of transmittance in the visible range of spectrum. IBAD thus confirmed as a suitable method for modification of optical properties.
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Adhesion of plasma polymer films deposited from tetravinylsilane monomer
Plichta, Tomáš ; Salyk, Ota (referee) ; Čech, Vladimír (advisor)
This bachelor thesis deals with the characterization of thin films of plasma polymers prepared from monomers of tetravinylsilane (TVS) and deposited on planar silicon substrates. Plasma enhanced chemical vapor deposition (PE CVD) was used as a method of thin films preparation. Three power series were prepared from pure TVS and two mixtures TVS with argon and oxygen. The main characterization methods were scratch tests and atomic force microscopy (AFM) is used to assess the adhesion degree of the layers and topography of scratches. To assess the characteristics and context the layer thickness was measured by spectroscopic ellipsometry (ELL) and elastic modulus using nanoindentation. The collected data were used to assess the reproducibility of the results with the regard to the purity of substrates and adhesion layers, depending on the deposition conditions and layers aging.
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Use of biomaterials for optoelectronic applications in semiconductor technology
Čuboň, Tomáš ; Salyk, Ota (referee) ; Zmeškal, Oldřich (advisor)
The bachelor´s thesis is aimed to measurement optical properties of thin layer films of biomaterials which could be used in optoelectronics and semiconductor technology. DNA and BSA were chosen in order to represent such extensive group of biomaterials. The theoretical part describes the way of preparation of thin layer. It also provides some information about basic phenomena and biomaterials. The practical part is focused on the description of preparation of thin layer film using spin-coating method. The chosen materials were studied by optical microscopy, UV-VIS spectrophotometry and spectroscopic ellipsometry. The thickness of prepared samples was measured by mechanic profilometry. In the last section of the bachelor´s thesis, there is discussion and evaluation of results.
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Adhesion of a-SiOC:H films on planar substrates
Lepcio, Petr ; Salyk, Ota (referee) ; Čech, Vladimír (advisor)
This bachelor thesis deals with preparation of thin films of plasma polymers prepared by plasma-enhanced chemical vapor deposition. Tetravinylsilane was used as a monomer. Two sets of samples were prepared. Samples of the first set were prepared at different effective powers from pure tetravinylsilane and samples of the second set were prepared from deposition mixture of tetravinylsilane with different oxygen content at constant effective power. The film thickness was evaluated by spectroscopic ellipsometry and chemical structure by infrared spectroscopy. A scratch test was used to determine adhesion characterized by the critical normal load. An appearance of performed scratches was obtained by atomic force microscopy (AFM). Film adhesion influenced by the effective power and oxygen content in deposition mixture was discussed based on the received data.
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