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Surface topography of a-CSi:H films deposited by continuous wave PECVD
Blažková, Naďa ; Pálesch, Erik (referee) ; Čech, Vladimír (advisor)
The thesis describes surface topography of a-CSi:H films deposited by continuous wave plasma enhanced chemical vapor deposition (PECVD) based on tetravinylsilane monomer (TVS). Thin films are completely used in many fields of modern technologies and their physical and mechanical properties are affected by thin film preparation techniques. In this thesis the thin films were deposited by PECVD method on silicon wafers with the pure TVS monomer. Deposited samples were topographically described and analyzed using atomic force microscopy (AFM). The main characteristics which were described are RMS roughness, autocorrelation function and a size distribution of grains on the thin film surface. Analysis was realized with two sets of samples with different powers and thickness. The main results were statistically evaluated like a mixture of object on the surface prepared in different deposition conditions.
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Surface topography and mechanical properties of thin films on tetravinylsilane basis
Plichta, Tomáš ; Klapetek, Petr (referee) ; Čech, Vladimír (advisor)
Proposed diploma thesis is focused on preparation and characterization of the plasma polymer thin films based on tetravinylsilane monomer (TVS). Plasma enhanced chemical vapour deposition (PECVD) method involving pulse and continual plasma discharge modes were used for thin film deposition on silicon wafer pieces. Reactive plasma composition was containing pure TVS or mixtures of TVS and argon or oxygen gas. Atomic force microscopy was used for surface topography and roughness characterization. Cyclic nanoindentation was involved to measurements to determine the Young’s modulus and hardness of prepared films and scratch test was performed to evaluate the degree of adhesion. Special attention was drawn to the characterization of films with a Young’s modulus below 10 GPa. Tip geometry of indenter influence on scratch test was also commented. Surface and mechanical properties of thin films in relation to the deposition conditions were correlated to the obtained results and final analysis of deposition conditions influence is proposed.
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Adhesion of plasma polymer films deposited from tetravinylsilane monomer
Plichta, Tomáš ; Salyk, Ota (referee) ; Čech, Vladimír (advisor)
This bachelor thesis deals with the characterization of thin films of plasma polymers prepared from monomers of tetravinylsilane (TVS) and deposited on planar silicon substrates. Plasma enhanced chemical vapor deposition (PE CVD) was used as a method of thin films preparation. Three power series were prepared from pure TVS and two mixtures TVS with argon and oxygen. The main characterization methods were scratch tests and atomic force microscopy (AFM) is used to assess the adhesion degree of the layers and topography of scratches. To assess the characteristics and context the layer thickness was measured by spectroscopic ellipsometry (ELL) and elastic modulus using nanoindentation. The collected data were used to assess the reproducibility of the results with the regard to the purity of substrates and adhesion layers, depending on the deposition conditions and layers aging.
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Adhesion of a-SiOC:H films on planar substrates
Lepcio, Petr ; Salyk, Ota (referee) ; Čech, Vladimír (advisor)
This bachelor thesis deals with preparation of thin films of plasma polymers prepared by plasma-enhanced chemical vapor deposition. Tetravinylsilane was used as a monomer. Two sets of samples were prepared. Samples of the first set were prepared at different effective powers from pure tetravinylsilane and samples of the second set were prepared from deposition mixture of tetravinylsilane with different oxygen content at constant effective power. The film thickness was evaluated by spectroscopic ellipsometry and chemical structure by infrared spectroscopy. A scratch test was used to determine adhesion characterized by the critical normal load. An appearance of performed scratches was obtained by atomic force microscopy (AFM). Film adhesion influenced by the effective power and oxygen content in deposition mixture was discussed based on the received data.
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